Improved patterning of ITO coated with gold masking layer on glass substrate using nanosecond fiber laser and etching
Improved patterning of ITO coated with gold masking layer on glass substrate using nanosecond fiber laser and etching
复制标题
使用纳秒光纤激光和蚀刻改进玻璃基板上涂有金掩模层的 ITO 图案
DOI：
10.1016/j.apsusc.2014.10.122
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发表时间：
2015
影响因子：
6.7
通讯作者：
Kim Hyunchul
中科院分区：
文献类型：
--
作者：
N. N. Tan;D. T. Hung;Vo Tran Anh;Kang Bong;Kim Hyunchul
本文提出了一种与短脉冲激光直接写入法相比，具有更高的图案质量和生产率的氧化铟锡薄膜图案方法。我们在玻璃基板上溅射了一层薄薄的ITO层，然后在ITO层上镀了一层薄薄的金层。利用镱脉冲光纤激光器（λ= 1064 nm）产生的激光诱导等离子体对三层玻璃- ito -金的组合结构进行了图像化处理。结果表明，扫描速度为50 mm/s，脉冲时间为14 ns，重复频率为7.5 kHz是制备ITO通道的最佳工艺参数。在此条件下，获得了23.4 μm宽、20 nm深的通道。然而，堆积的尖峰（高度约15 nm）导致通道质量下降，因此在一些图案位置发生短路。通过将ITO层浸入腐蚀剂（18% HCl）中，可以完全去除这些堆积的尖峰。在ITO表面添加金掩蔽层，在不降低ITO厚度的情况下，提高了通道表面质量。此外，还研究了重复频率、扫描速度和蚀刻特性对表面质量的影响。
In this paper, an indium–tin oxide (ITO) thin-film patterning method for higher pattern quality and productivity compared to the short-pulsed laser direct writing method is presented. We sputtered a thin ITO layer on a glass substrate, and then, plated a thin gold layer onto the ITO layer. The combined structure of the three layers (glass–ITO–gold) was patterned using laser-induced plasma generated by an ytterbium pulsed fiber laser (λ= 1064 nm). The results showed that the process parameters of 50 mm/s in scanning speed, 14 ns pulse duration, and a repetition rate of 7.5 kHz represented optimum conditions for the fabrication of ITO channels. Under these conditions, a channel 23.4 μm wide and 20 nm deep was obtained. However, built-up spikes (∼15 nm in height) resulted in a decrease in channel quality, and consequently, short circuit occurred at some patterned positions. These built-up spikes were completely removed by dipping the ITO layer into an etchant (18 wt.% HCl). A gold masking layer on the ITO surface was found to increase the channel surface quality without any decrease in ITO thickness. Moreover, the effects of repetition rate, scanning speed, and etching characteristics on surface quality were investigated.