Laser pulse duration dependence of blister formation on back-radiated Ti thin films for BB-LIFT
Laser pulse duration dependence of blister formation on back-radiated Ti thin films for BB-LIFT
复制标题
BB-LIFT 背辐射钛薄膜上气泡形成的激光脉冲持续时间依赖性
DOI:
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发表时间:
2016
期刊:
影响因子:
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通讯作者:
E. Campbell
中科院分区:
文献类型:
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作者:
N. Goodfriend;S. V. Starinskiy;O. Nerushev;N. Bulgakova;A. Bulgakov;E. Campbell
The influence of the laser pulse duration on the mechanism of blister formation in the particle transfer technique, blister-based laser-induced forward transfer, was investigated. Pulses from a fs Ti:Sapphire laser (120 fs, 800 nm) and from a ns Nd:YAG laser (7 ns, 532 nm) were used to directly compare blister formation on thin titanium films of ca. 300 nm thickness, deposited on glass. The different blister morphologies were compared and contrasted by using optical microscopy and atomic force microscopy. The results provide evidence for different blister formation mechanisms: for fs pulses the mechanism is predominantly ablation at the metal–glass interface accompanied by confined plasma expansion and deformation of the remaining metal film; for ns pulses it is heating accompanied by thermal expansion of the metal film.