Experimental Observation of Temperature and Pressure Induced Frequency Fluctuations in Silicon MEMS Resonators
Experimental Observation of Temperature and Pressure Induced Frequency Fluctuations in Silicon MEMS Resonators
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DOI:
10.1109/jmems.2021.3077633
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发表时间:
2021-08-01
影响因子:
2.7
通讯作者:
Seshia, Ashwin A.
中科院分区:
文献类型:
--
作者:
Pandit, Milind;Mustafazade, Arif;Seshia, Ashwin A.
Silicon MEMS resonators are increasingly being adopted for applications in timing and frequency control, as well as precision sensing. It is well established that a key limitation to performance is associated with sensitivity to environmental variables such as temperature and pressure. As a result, technical approaches to address these factors such as vacuum sealing and ovenization of the resonators in a temperature controlled system have been introduced. However, residual sensitivity to such effects can still serve as a significant source of frequency fluctuations and drift in precision devices. This is experimentally demonstrated in this paper for a precision oven-controlled and vacuum-sealed silicon resonators. The frequency fluctuations of oscillators constructed using two separate nearly-identical co-located resonators on the same chip are analysed and differential frequency fluctuations are examined as a means of reducing the impact of common-mode effects such as temperature and pressure. For this configuration, our results show that the mismatch of temperature and pressure coefficients between the resonators ultimately limits the frequency stability.