Analysis of via impedance variations with a Polynomial Chaos method
Analysis of via impedance variations with a Polynomial Chaos method
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使用多项式混沌方法分析过孔阻抗变化
DOI：
10.1109/isemc.2011.6038436
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发表时间：
2011
期刊：
影响因子：
--
通讯作者：
Jun Fan
中科院分区：
文献类型：
--
作者：
Jianxiang Shen;Hanfeng Wang;Ji Chen;Jun Fan
在本文中，我们提出了一个用于优化和分析实际通孔结构的等效特性阻抗的系统框架。该框架包括 (a) 使用遗传算法优化阻抗匹配的通孔结构，以及 (b) 通过多项式混沌 (PC) 方法对等效特性阻抗对通孔结构的各种几何参数中的制造不确定性的敏感性进行数值表征。 PC方法可以有效地用于计算重要的统计信息，例如关于设计变量的矩、概率和敏感性。 PC 方法实现起来很简单，并且比传统的蒙特卡罗 (MC) 方法快几个数量级。所提出的框架自然会在存在多种不确定性的情况下产生严格的电磁设计/控制方法。
In this paper, we propose a systematic framework for the optimization and analysis of the equivalent characteristic impedance of practical via structures. The framework consists of (a) optimizing via structures for impedance matching using a Genetic algorithm, and (b) numerically characterize, by Polynomial Chaos (PC) method, the sensitivity of the equivalent characteristic impedance to the manufacturing uncertainties in the various geometrical parameters of a via structure. The PC method can be effectively used to compute important statistical information, such as moments, probabilities and sensitivities with respect to the design variables. The PC method is straightforward to implement, and can be orders of magnitude faster than the traditional Monte Carlo (MC) method. The proposed framework naturally leads to a rigorous methodology for EM design/control in the presence of multiple sources of uncertainty.