The Effect of Sputtering Parameters on the Film Properties of Molybdenum Back Contact for CIGS Solar Cells
The Effect of Sputtering Parameters on the Film Properties of Molybdenum Back Contact for CIGS Solar Cells
复制标题
溅射参数对 CIGS 太阳能电池钼背接触薄膜性能的影响
DOI：
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发表时间：
2013
期刊：
影响因子：
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通讯作者：
C. Kuo
中科院分区：
文献类型：
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作者：
P. Huang;Chia;M. Lin;C. Chou;C. Hsu;C. Kuo
钼（Mo）薄膜被广泛用作CIGS基太阳能电池的背接触。本文确定了最佳设置的溅射参数的钠钙玻璃基板上制备的钼薄膜，使用直流（dc）磁控溅射，与金属钼靶，在氩气环境中。采用田口法和L9正交表、信噪比和方差分析来确定涂层操作的性能特征。主要的溅射参数，如工作压力（mTorr），直流功率（W），和衬底温度（°C），是相对于Mo膜的结构特征，表面形貌和电气性能的优化。对每个膜进行胶带测试以确定膜的粘合强度。实验结果表明，工作压力对薄膜的电阻率和反射率有显著影响。随着溅射功率的增大，Mo膜的主峰（110）强度逐渐增大，半高宽逐渐减小。此外，Mo双层的应用展示了良好的粘附性和低电阻率。
Molybdenum (Mo) thin films are widely used as a back contact for CIGS-based solar cells. This paper determines the optimal settings for the sputtering parameters for an Mo thin film prepared on soda lime glass substrates, using direct current (dc) magnetron sputtering, with a metal Mo target, in an argon gas environment. A Taguchi method with an L9 orthogonal array, the signal-to-noise ratio, and an analysis of variances is used to determine the performance characteristics of the coating operation. The main sputtering parameters, such as working pressure (mTorr), dc power (W), and substrate temperature (°C), are optimized with respect to the structural features, surface morphology, and electrical properties of the Mo films. An adhesive tape test is performed on each film to determine the adhesion strength of the films. The experimental results show that the working pressure has the dominant effect on electrical resistivity and reflectance. The intensity of the main peak (110) for the Mo film increases and the full width at half maximum decreases gradually as the sputtering power is increased. Additionally, the application of an Mo bilayer demonstrates good adherence and low resistivity.