Nano- to Macro-Sized Heterogeneities Using Cleavable Diblock Copolymers
Nano- to Macro-Sized Heterogeneities Using Cleavable Diblock Copolymers
复制标题
使用可裂解二嵌段共聚物研究纳米到宏观尺寸的异质性
DOI：
10.1021/ma0489117
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发表时间：
2004
期刊：
影响因子：
5.5
通讯作者：
T. Russell
中科院分区：
文献类型：
--
作者：
James T. Goldbach;K. Lavery;J. Penelle;T. Russell
在嵌段之间的连接点含有[4π + 4π]蒽光二聚体的聚苯乙烯-嵌段-聚（甲基丙烯酸甲酯）共聚物（PS-AA-PMMA）在加热至130°C以上或通过280 nm的紫外线照射时可以裂解为母体均聚物嵌段。 PS-AA-PMMA 经过表征，然后用于薄膜中，在聚苯乙烯 (PS) 基质中创建微观到宏观的聚（甲基丙烯酸甲酯）(PMMA) 域。薄膜中的微相分离形态最初是通过在 80°C 的超临界二氧化碳中对旋涂薄膜进行退火来实现的。随后的加热和/或紫外线照射用于裂解共聚物连接点，影响二嵌段共聚物原位转化为其母体均聚物。通过 SFM 研究了相分离从 PS 基质中的 PMMA 微域到宏观相分离结构的演变。随后用选择性溶剂洗涤去除均聚物，产生凸起的纳米结构或纳米多孔模板。
Polystyrene-block-poly(methyl methacrylate) copolymers containing [4π + 4π] anthracene photodimer at the junction point between the blocks (PS-AA-PMMA) can be cleaved to the parent homopolymer blocks upon heating above 130 °C or by UV irradiation at 280 nm. PS-AA-PMMA was characterized and then used in thin films to create micro- to macroscale poly(methyl methacrylate) (PMMA) domains in a polystyrene (PS) matrix. Microphase-separated morphologies in thin films were initially achieved by annealing spin-coated films in supercritical carbon dioxide at 80 °C. Subsequent heating and/or UV irradiation was used to cleave the copolymer junction point, affecting an in situ conversion of the diblock copolymer to its parent homopolymers. The evolution of phase separation, from microdomains of PMMA in a matrix of PS to macrophase-separated structures, was investigated by SFM. Subsequent washing with selective solvents removed homopolymer, producing raised nanostructures or nanoporous templates.