Visible light irradiation effects on chemical bonding structure of amorphous carbon nitride thin films using synchrotron radiation infrared rays
Visible light irradiation effects on chemical bonding structure of amorphous carbon nitride thin films using synchrotron radiation infrared rays
复制标题
DOI：
10.1016/j.jnoncrysol.2021.120963
复制
发表时间：
2021-06-10
影响因子：
3.5
通讯作者：
Kishimura，Hiroaki
中科院分区：
文献类型：
--
作者：
Aono，Masami;Kishimura，Hiroaki
利用SPring-8同步辐射的高强度红外（IR）射线，研究了反应溅射法制备的非晶氮化碳（a-CNx）薄膜的光致形变与面内化学键态分布的关系。在573 K下沉积的薄膜具有最大量的光致变形，而在873 K下沉积的薄膜没有光响应。当光束直径减小到几微米时，用IR射线照射膜以获得膜表面上每个点的IR光谱。结果发现，a-CN x薄膜的化学键合状态在平面内不均匀，并且1100-1800 cm-1范围内的光谱强度根据位置而变强或变弱。当用可见光激光照射时，吸收带光谱强度基于含氮的六重环结构被指定，并且在经历光致变形的膜中C双键N链增加8%-10%。在没有光致变形的a-CNx膜中，没有观察到IR光谱辐照变化。
Using high-intensity infrared (IR) rays from the SPring-8 synchrotron radiation, we investigated the relationship between the photo-induced deformation and the in-plane distribution of the chemical bonding state of amorphous carbon nitride (a-CNx) thin films prepared via reactive sputtering. The film deposited at 573 K has the largest amount of photo-induced deformation and the film deposited at 873 K shows no photoresponse. When the beam diameter was reduced to a few micrometers, the films were irradiated with IR rays to obtain the IR spectra at each point on the film surface. Consequently, it was discovered that the chemical bonding state of the a-CNxthin films was not uniform in the plane, and that the spectral intensity in the range of 1100–1800 cm−1was stronger or weaker depending on the location. When irradiated with a visible light laser, the absorption band spectral intensity was assigned based on a sixfold ring structure containing nitrogen and the Cdouble bondN chain increased by 8%–10% in a film that underwent photo-induced deformation. In the a-CNxfilm with no photo-induced deformation, no IR spectral irradiation change was observed.