Chemically amplified positive resists for two-photon three-dimensional microfabrication
Chemically amplified positive resists for two-photon three-dimensional microfabrication
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DOI：
10.1002/adma.200390120
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发表时间：
2003-03-17
影响因子：
29.4
通讯作者：
Perry, JW
中科院分区：
文献类型：
--
作者：
Yu, TY;Ober, CK;Perry, JW
报道了一种简单的一步法制备三维（3D）微结构的方法。基于双光子激发态化学，开发了化学放大正性光刻胶，并研究了光刻工艺。如制造材料所示的结果（见图）表明，正色调双光子3D微制造可能是精密微流体和微光学器件的有价值的途径。
A simple one‐step process to fabricate three‐ dimensional (3D) microstructuresis reported. Based on two‐photon excited‐state chemistry, a chemically amplified positive tone photoresist has been developed and the lithographic process investigated. The results, as indicated by the fabricated material (see Figure) suggest that positive tone two‐photon 3D microfabrication may be a valuable route to precision microfluidic and microoptical devices.