Modeling of Chemical Reactive Flows in a Chemical Vapor Deposition Reactor with Complex Geometry

化学气相分解（CVD）是一种重要的 半导体及化合物制造技术 半导体材料，在高速 电子和超级计算机技术。 桶式反应堆是一种 在大气压下操作的商业CVD反应器，或 减压。 不幸的是，膜沉积的均匀性 是这个反应堆中一个真实的问题。 流动模式有三种 维度不对称 这项拟议工作的目标是 如下 第一种是使用最先进的有限元 计算流体动力学中的技术来解决 桶式反应器中的复杂反应流。 不同有限 单元方法导致不同的一致质量矩阵。 的 目标是找到一个算法，它提供了一个“最佳” 具有最小数值扩散的一致质量矩阵， 寄生振荡 开发的算法将用于 研究了气体流量，悬浮体转速， 气体喷嘴位置、衬底温度和操作 对现有的沉积速率和均匀性的压力 反应堆 它也可以作为新气体的设计工具 配电系统和反应堆设计。

Chemical vapor decomposition (CVD) is one of the important techniques in the fabrication of semiconductor and compound semiconductor materials which are crucial in high speed electronics and supercomputer technology. Barrel reactor is a commercial CVD reactor operating at atmospheric pressure or reduced pressure. Unfortunately, uniformity in film deposition is a real concern in this reactor. The flow patterns are three dimensional asymmetric. The objectives of this proposed work are as follows. The first is to use state-of-the-art finite element techniques in computational fluid dynamics to solve for the complex reactive flows in a barrel reactor. Different finite element methods lead to different consistent mass matrices. The goal is to find an algorithm which provides an "optimal" consistent mass matrix with minimum numerical diffusion and spurious oscillation. The developed algorithm will be used to study the effects of gas flow rates, suspector rotating speed, gas nozzle locations, substrate temperature and operating pressure on the deposition rate and uniformity of existing reactors. It can also be used as a design tool for new gas distribution system and reactor design.