Presidential Young Investigators Award: Sources and Applications for Short Wavelength Electromagnetic Radiation

总统青年研究员奖：短波长电磁辐射的来源和应用

• 批准号: 9057675
• 负责人: John Booske
• 金额: $ 32.25万
• 依托单位: University of Wisconsin-Madison
• 依托单位国家: 美国
• 项目类别: Continuing Grant
• 财政年份: 1990
• 资助国家: 美国
• 起止时间: 1990-10-01 至 1997-03-31
• 项目状态: 已结题
• 来源: https://www.nsf.gov/awardsearch/showAward?AWD_ID=9057675&HistoricalAwards=false
• 关键词: Presidential; Young; Investigators; Award; Sources

Research is planned to make new advances in mm-and sub-mm wave sources, as well as their applications. This work will be based on prior experience in developing mm-wave Free Electron Laser devices at reduced beam voltages (both high power 0.5-1.0 MV FEL oscillators and 50 kV harmonic "ubitron" amplifiers). The new directions, however, will emphasize studies of compact, "low" voltage ( 100 kV), and moderate power (0.1-100 kW) devices to be compatible with commercially practical civilian and government applications. To accomplish new developments in this field, research innovations in electron beam generation and focusing techniques, small-scale radiation cavities and periodic structures, and nonlinear efficiency enhancement and mode control techniques will be carried out. Also research on compact periodic structures as an opportunity to research, develop, and perform (scaled) testing of new insertion devices for high energy electron storage rings will be performed. Such insertion devices should extend the capabilities of U.S. storage ring facilities as high brightness IR, VUV, and x-ray light source facilities for spectroscopic, materials science, lithographic, and biomedical applications. Finally, in addition to the ceramic sintering process, there are several new applications for moderate power mm-wave sources such as, mm-wave heating of a compact, high density, mirror plasma to efficiently generate soft x-rays for lithography and materials processing applications. Another interest is to study the use of mm-waves for improved thermal processing of dielectric coatings. A third area of interest would be the previously mentioned use of coherent sub-mm sources, (i.e., wavelengths between 0.01-1.0 mm) for spectroscopy of various chemical chain reactions and solid-state semi-conductor phenomena.

计划在毫米波和亚毫米波及其应用方面取得新的进展。这项工作将基于先前在降低束流电压(高功率0.5-1.0 mV自由电子激光振荡器和50千伏谐波“ubitron”放大器)下开发毫米波自由电子激光设备的经验。然而，新的方向将侧重于紧凑型、“低”电压(100千伏)和中等功率(0.1-100千瓦)器件的研究，以兼容商业上实际的民用和政府应用。为实现这一领域的新发展，在电子束产生和聚焦技术、小型辐射腔和周期结构等方面的研究创新，并将开展非线性效率增强和模式控制技术。此外，还将对紧凑的周期性结构进行研究，以此作为研究、开发和执行(按比例)测试高能电子存储环的新插入器件的机会。这样的插入设备应该扩展美国存储环设施的能力，如用于光谱、材料科学、光刻和生物医学应用的高亮度IR、VUV和X射线光源设施。最后，除了陶瓷烧结工艺外，中等功率毫米波光源还有几个新的应用，例如紧凑、高密度的毫米波加热，镜像等离子体以高效地产生用于光刻和材料加工应用的软X射线。另一个兴趣是研究毫米波用于改进介质涂层的热加工。第三个感兴趣的领域将是前面提到的相干亚毫米源的使用，(即，波长在0.01-1.0毫米之间)，用于各种化学链反应和固态半导体现象的光谱研究。