Presidential Young Investigator Award

总统青年研究员奖

• 批准号: 9157084
• 负责人: Charles Mullins
• 金额: $ 31.25万
• 依托单位: University of Texas at Austin
• 依托单位国家: 美国
• 项目类别: Continuing Grant
• 财政年份: 1991
• 资助国家: 美国
• 起止时间: 1991-07-01 至 1997-12-31
• 项目状态: 已结题
• 来源: https://www.nsf.gov/awardsearch/showAward?AWD_ID=9157084&HistoricalAwards=false
• 关键词: Presidential; Young; Investigator; Award

This grant is to provide research support for Dr. Charles B. Mullins under the National Science Foundation's Presidential Young Investigator Awards Program. The ability to selectively modify material interfaces is important for: the surface hardening for mechanical or corrosive wear resistance, the production of thin films on semiconductors for advanced microelectonic devices, the deposition of polycrystalline and single crystalline diamond thin films for several advanced technologies, and the fabrication of advanced catalytic materials. The focus of this research is to study in detail, using both experimental techniques and mathematical modelling, the basic mechanisms, kinetics and dynamics of relevant chemical reactions at material interfaces. Concomitant with this effort, alternative (non-thermal) methods to promote chemical reactions, selectively, at interfaces will also be studied. The work will use an ultra-high vacuum scattering apparatus to investigate the influence of: (1) molecular kinetic and vibrational energy, (2) the bombardment of surface species with ions, radicals electrons and energetic neutral rare gas atoms, (3) intense electromagnetic radiation (laser and synchroton), (4) substrate heating and (5) surface and bulk additives (dopants, promoters and inhibitors) on chemical reactions relevant to thin film formation. The initial experimental work will include studies of the surface chemical processes inherent in the formation of silicon nitride films and in the doping of silicon.

这笔赠款是为查尔斯B博士提供研究支持。 马林斯在国家科学基金会的总统 青年研究者奖计划。 选择性地改变材料界面的能力是 重要用途：机械或机械加工的表面硬化 耐腐蚀耐磨，生产薄膜对 先进微电子器件用半导体 多晶和单晶金刚石的沉积 适用于多种先进技术的薄膜，以及 制造先进的催化材料。 的焦点 本研究是在详细研究的基础上， 技术和数学模型，基本机制， 有关化学反应的动力学和动力学. 材料界面 在作出这一努力的同时， 促进化学品的替代（非热）方法 还将研究界面处的选择性反应。 这项工作将使用超高真空散射装置， 研究了以下因素的影响：（1）分子动力学和 振动能，（2）表面物种的轰击 离子、自由基、电子和高能中性稀有气体 原子，（3）强烈的电磁辐射（激光和 同步），（4）衬底加热和（5）表面和体 添加剂（掺杂剂、促进剂和抑制剂） 与薄膜形成有关的反应。 初始 实验工作将包括研究表面化学物质 氮化硅膜形成中固有的工艺 以及硅的掺杂。