Presidential Young Investigator Award

这项拨款是为Charles B. Mullins博士在国家科学基金会总统青年研究者奖励计划下提供研究支持。选择性修改材料界面的能力对于以下方面很重要：机械或腐蚀耐磨性的表面硬化，用于先进微电子器件的半导体薄膜的生产，用于几种先进技术的多晶和单晶金刚石薄膜的沉积，以及先进催化材料的制造。本研究的重点是利用实验技术和数学模型，详细研究材料界面上相关化学反应的基本机理、动力学和动力学。与此同时，还将研究在界面上选择性地促进化学反应的替代（非热）方法。本工作将使用超高真空散射装置研究以下因素的影响：(1)分子动力学和振动能；(2)离子、自由基、电子和高能中性稀有气体原子对表面物质的轰击；(3)强电磁辐射（激光和同步子）；(4)衬底加热；(5)表面和本体添加剂（掺杂剂、促进剂和抑制剂）对与薄膜形成有关的化学反应的影响。最初的实验工作将包括研究氮化硅薄膜形成和硅掺杂中固有的表面化学过程。

This grant is to provide research support for Dr. Charles B. Mullins under the National Science Foundation's Presidential Young Investigator Awards Program. The ability to selectively modify material interfaces is important for: the surface hardening for mechanical or corrosive wear resistance, the production of thin films on semiconductors for advanced microelectonic devices, the deposition of polycrystalline and single crystalline diamond thin films for several advanced technologies, and the fabrication of advanced catalytic materials. The focus of this research is to study in detail, using both experimental techniques and mathematical modelling, the basic mechanisms, kinetics and dynamics of relevant chemical reactions at material interfaces. Concomitant with this effort, alternative (non-thermal) methods to promote chemical reactions, selectively, at interfaces will also be studied. The work will use an ultra-high vacuum scattering apparatus to investigate the influence of: (1) molecular kinetic and vibrational energy, (2) the bombardment of surface species with ions, radicals electrons and energetic neutral rare gas atoms, (3) intense electromagnetic radiation (laser and synchroton), (4) substrate heating and (5) surface and bulk additives (dopants, promoters and inhibitors) on chemical reactions relevant to thin film formation. The initial experimental work will include studies of the surface chemical processes inherent in the formation of silicon nitride films and in the doping of silicon.