CAREER ADVANCEMENT AWARD (ROW): Determination of Optimum Wavelength for High Resolution Soft-X-Ray Microscopy Using aLaser Produced Plasma Source

这项职业发展奖提案概述了一项计划，以确定从高对比度图像样本中获得高对比度图像的能力以及低原子序数材料，当用波长从10 nm到40 nm的软X射线照射时。尽管该波长区域的反射率非常低，但仍具有高对比度成像能力，为研制激光等离子体光源照明的超高分辨率(0.03um)软X射线反射显微镜提供了基础。这种显微镜的一个重要应用将是用于0.1um特征尺寸的薄膜掩模的缺陷检测系统-射线邻近光刻。

This proposal for a Career Advancement Award outlines a program to determine the capacity of obtaining high contrast images in reflection from samples of high and low atomic number materials when illuminated with soft-x-rays of wavelengths ranging from 10nm-40nm. The demonstration of high contrast image capabilities in spite of very low reflectivities in this wavelength region, would provide the basis for developing an ultra-high- resolution (0.03um) soft-x-ray reflection microscope illuminated by a laser plasma source. One important application of such a microscope would be a defect inspection system for 0.1um feature size membrane masks for x-ray proximity lithography.