Microscale Thermal Radiation Properties of Metal Films

金属薄膜的微尺度热辐射特性

• 批准号: 9210727
• 负责人: Sunil Kumar
• 金额: --
• 依托单位: Polytechnic University of New York
• 依托单位国家: 美国
• 项目类别: Standard Grant
• 财政年份: 1992
• 资助国家: 美国
• 起止时间: 1992-09-01 至 1996-08-31
• 项目状态: 已结题
• 来源: https://www.nsf.gov/awardsearch/showAward?AWD_ID=9210727&HistoricalAwards=false
• 关键词: Microscale; Thermal; Radiation; Properties; Metal

The objective of the proposed research is twofold: (i) to theoretically understand and predict the radiation properties of thin metallic films from the fundamentals of microscopic electron transport and electromagnetic wave propagation, and (ii) to experimentally evaluate the radiation properties of such films. The theoretical study will evaluate radiation properties by analyzing coupled Boltzmann and Maxwell's equations. The experimental aspects will include fabrication of thin films of different materials and thicknesses by sputter deposition, comprehensive microstructure and surface characterization, and laser reflection and transmission evaluations.

拟议研究的目标有两个：（一） 从理论上理解和预测辐射特性 从微观的基本原理， 电子传输和电磁波传播，以及 (ii)通过实验评估 这样的电影。理论研究将评估辐射 通过分析耦合玻尔兹曼和麦克斯韦的性质 方程实验方面将包括制造 不同材料和厚度的薄膜， 溅射沉积、综合显微组织和表面 表征，以及激光反射和透射 评价。