Microscale Thermal Radiation Properties of Metal Films
Microscale Thermal Radiation Properties of Metal Films
批准号:
9210727
负责人:
Sunil Kumar
金额:
$0.0万
依托单位国家:
美国
项目类别:
Standard Grant
财政年份:
1992
资助国家:
美国
项目状态:
已结题
起止时间:
1992-09-01 至 1996-08-31
中文摘要
本研究的目的有两个:(1)从微观电子传输和电磁波传播的基本原理出发,从理论上理解和预测金属薄膜的辐射特性;(2)从实验上评价这种薄膜的辐射特性。理论研究将通过分析耦合玻尔兹曼和麦克斯韦方程组来评估辐射特性。实验方面将包括通过溅射沉积制备不同材料和厚度的薄膜,全面的微观结构和表面表征,以及激光反射和透射评估。
英文摘要
The objective of the proposed research is twofold: (i) to theoretically understand and predict the radiation properties of thin metallic films from the fundamentals of microscopic electron transport and electromagnetic wave propagation, and (ii) to experimentally evaluate the radiation properties of such films. The theoretical study will evaluate radiation properties by analyzing coupled Boltzmann and Maxwell's equations. The experimental aspects will include fabrication of thin films of different materials and thicknesses by sputter deposition, comprehensive microstructure and surface characterization, and laser reflection and transmission evaluations.
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