Dissolution Inhibition in Positive Novolak Resists

正性酚醛清漆抗蚀剂的溶解抑制

• 批准号: 9221159
• 负责人: Arnost Reiser
• 金额: --
• 依托单位: Polytechnic University of New York
• 依托单位国家: 美国
• 项目类别: Continuing grant
• 财政年份: 1993
• 资助国家: 美国
• 起止时间: 1993-04-01 至 1995-09-30
• 项目状态: 已结题
• 来源: https://www.nsf.gov/awardsearch/showAward?AWD_ID=9221159&HistoricalAwards=false
• 关键词: Dissolution; Inhibition; Positive; Novolak; Resists

The dissolution of novolak polymers and other hydroxylic resins will be studied in terms of a molecular model where the rate of dissolution is controlled by percolative diffusion of base into the solid matrix. The percolation theory provides a scaling law for the dependence of dissolution rate on the concentration of hydrophilic sites (hydroxyl groups). The materials to be studied will be novolak resins from mixtures of o-cresol and p-cresol, and copolymers of hexafluorodimethylhydroxystyrene and styrene. Dissolution inhibition of novolak and other resins is the basis of the most important imaging materials in the semiconductor industry. Yet the nature of this phenomenon is incompletely understood. This research aims to provide an explanation in terms of the hydrophilic-hydrophobic balance in these resins.

我们将用分子模型来研究酚醛聚合物和其他羟基树脂的溶解，在分子模型中，溶解速度是由碱在固体基质中的渗透扩散控制的。渗流理论为溶解速度与亲水中心(羟基)浓度的关系提供了一个标度定律。研究的材料将是邻甲酚和对甲酚混合物中的酚醛树脂，以及六氟二甲基羟基苯乙烯和苯乙烯的共聚物。酚醛树脂和其他树脂的溶解抑制是半导体工业中最重要的成像材料的基础。然而，这一现象的本质还没有完全被理解。这项研究旨在从亲水-疏水平衡的角度对这些树脂进行解释。