Dissolution Inhibition in Positive Novolak Resists

诺沃拉克聚合物和其他羟基树脂的溶解将根据分子模型进行研究，其中溶解速率由碱渗透扩散到固体基质中控制。渗透理论为溶解速率依赖于亲水性位点（羟基）的浓度提供了一个标度定律。研究的材料将是邻甲酚和对甲酚混合物制成的新树脂，以及六氟二甲基羟苯乙烯和苯乙烯的共聚物。溶解抑制novolak和其他树脂是半导体工业中最重要的成像材料的基础。然而，人们对这种现象的本质还不完全了解。本研究旨在从这些树脂的亲疏水平衡方面提供一个解释。

The dissolution of novolak polymers and other hydroxylic resins will be studied in terms of a molecular model where the rate of dissolution is controlled by percolative diffusion of base into the solid matrix. The percolation theory provides a scaling law for the dependence of dissolution rate on the concentration of hydrophilic sites (hydroxyl groups). The materials to be studied will be novolak resins from mixtures of o-cresol and p-cresol, and copolymers of hexafluorodimethylhydroxystyrene and styrene. Dissolution inhibition of novolak and other resins is the basis of the most important imaging materials in the semiconductor industry. Yet the nature of this phenomenon is incompletely understood. This research aims to provide an explanation in terms of the hydrophilic-hydrophobic balance in these resins.