Growth of Mullite Coatings by Chemical Vapor Deposition

化学气相沉积法生长莫来石涂层

• 批准号: 9311966
• 负责人: Vinod Sarin
• 金额: $ 4.94万
• 依托单位: Trustees of Boston University
• 依托单位国家: 美国
• 项目类别: Standard Grant
• 财政年份: 1993
• 资助国家: 美国
• 起止时间: 1993-05-01 至 1994-10-31
• 项目状态: 已结题
• 来源: https://www.nsf.gov/awardsearch/showAward?AWD_ID=9311966&HistoricalAwards=false
• 关键词: Growth; Mullite; Coatings; Chemical; Vapor

Under an SGER award the feasibility of growing thin coatings of mullite (3 Al2O3 . 2 SiO2) on ceramic substrates will be studied. The deposition method will be chemical vapor deposition of ultra- thin layers of the constituent compounds, followed by post- deposition heat treatment to form the mullite by inter diffusion. Process characteristics for development of optimal properties of oxidation resistance, resistance to sodium attack, spall resistance during thermal cycling, and hardness will be developed for substrates of silicon carbide and silicon nitride ceramics. The possibility of depositing functionally graded coatings by this technique on these substrates will also be evaluated.

在SGER奖下， 莫来石（3Al 2 O3. 2 SiO2）在陶瓷基板上的应用。 该沉积方法将是化学气相沉积的超 薄层的组成化合物，然后是后- 沉积热处理，通过相互扩散形成莫来石。 开发最佳性能的工艺特性 抗氧化性、抗钠侵蚀性、层裂性 在热循环过程中的电阻，和硬度将发展 用于碳化硅和氮化硅陶瓷的衬底。 沉积功能梯度涂层的可能性 也将评估在这些衬底上的这种技术。