Single Crystal Thin Films of Complex Oxide Ceramics by Pulsed Liquid Injection Metalorganic Chemical Vapor Decomposition

脉冲液体注射金属有机化学气相分解复合氧化物陶瓷单晶薄膜

• 批准号: 9400180
• 负责人: Rishi Raj
• 金额: $ 30.84万
• 依托单位: Cornell University
• 依托单位国家: 美国
• 项目类别: Continuing Grant
• 财政年份: 1994
• 资助国家: 美国
• 起止时间: 1994-06-01 至 1997-05-31
• 项目状态: 已结题
• 来源: https://www.nsf.gov/awardsearch/showAward?AWD_ID=9400180&HistoricalAwards=false
• 关键词: Single; Crystal; Thin; Films; Complex

9400180 Raj The goal of this research is the development of a new manufacturing design concept for the synthesis of single crystal thin films of complex oxides from metalorganic precursors. The concept embodies molecular control for layer-by-layer growth, large area single crystal growth of thin films, low environmental impact, and a table top design that is economical and flexible. The concept employs pulsed injection of very small amounts of liquid precursors directly into a low pressure reactor in order to achieve atom-layer by atom-layer growth of single crystal films. The use of an ultrasonic nozzle to obtain reproducible deposition per pulse is a special feature of the research. The specific objective of the research is to develop viable models for the processing parameters that can be used to tailor manufacturing systems, based on the proposed concept, for specific applications. The process that will result from this research will enable monolayer-level control for the growth rate of the single crystal films used in microelectronic devices and, at the same time, allow considerable flexibility, cost-effectiveness and manufacturing potential for making films of various compositions of large area substrates.

小行星9400180 这项研究的目标是开发一种新的 单晶合成的制造设计概念 由金属有机前体制备的复合氧化物薄膜。 的 概念体现了逐层生长的分子控制，大型 大面积单晶生长薄膜，环境影响小， 以及经济和灵活的桌面设计。 的 概念采用非常少量液体的脉冲喷射 前体直接进入低压反应器，以实现 单晶薄膜的原子层接原子层生长。 使用超声波喷嘴获得可重复的沉积每脉冲是一个特殊的研究特点。 具体目标 这项研究的目的是开发可行的处理模型， 可用于定制制造系统的参数， 在提出的概念，具体应用。 这项研究的结果将使 单晶生长速率的单层水平控制 微电子器件中使用的薄膜，同时， 相当大的灵活性，成本效益和制造 制备大面积的各种组成的膜的潜力 印刷受体.