Development of Advanced Signal Processing Algorithms for On-Line Temperature Profile Measurement in Semiconductor Manufacturing

点击翻译按钮获取中文摘要

This research is directed towards the development, implementation, and demonstration of advanced model-based signal processing algorithms for real-time measurement of wafer temperature profile in Rapid Thermal Processing (RTP), RTP cluster tools are strategically important for submicron semiconductor manufacturing because of trends towards reduced thermal budget and tightened process control requirements on large diameter silicon wafers. Despite its significant advantages, commercial versions of RTP modules for various chemical vapor deposition applications are not available. In this project, the investigators are developing advanced model- based signal processing algorithms, which when coupled with the acoustic thermometry and acoustic/pyrometer approaches, accurately measure the wafer temperature profile at fast acquisition rates and with a minimum number of sensors. This entails algorithm development, implementation, and validation using real data from commercial RTP tools at UT-Austin and SEMATECH.