Oxidation Studies of Silicon Oxynitride Ceramics Using Time-Resolved Laser Reflectance

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9401856 Du Silicon oxynitride is an important structural ceramics. The Principal Investigator wants to study the mechanism that controls the oxidation behavior of silicon oxynitride. Comprehensive studies of oxidation on pure and dense silicon oxynitride will be carried out. To achieve the project objectives a time resolved laser reflectance technique will be used to accurately measure the growth of the oxide layer during oxidation in broad range. Several other techniques e.g. x-ray photoelectron spectroscopy, electron energy loss spectroscopy TEM will be used to perform the chemical and structural characterization of the oxide-substrate interfaces. %%% Study of the mechanisms that controls the oxidation behavior of one of the important structural ceramics, silicon oxynitride, is proposed to be carried out using the time resolved laser reflectance method and various x-ray and electron microscopic techniques. ***