RUI: Atomistic Studies of Diffusion and Growth of Materials for Field Emission Technology and the Effect of Alkali Adsorption

9510623 Roelofs首席研究员将应用最近开发的强大的原子学方法来解决钨和钼表面的生长和扩散问题。这项工作将为更好地理解这些材料中功函数的约化提供理论基础。该项目包括使用扩展的嵌入原子势通过直接和协调模式研究自扩散。利用分子动力学，研究人员将模拟制造方法，用来产生密集的锐场发射极尖端阵列。这些计算将为有源照明平板显示器的开发应用提供重要的基础。首席研究员将应用最新开发的强大的原子学方法来解决钨和钼表面的生长和扩散问题。这些计算将为开发取代液晶技术的有源照明平板显示器(例如，笔记本电脑)提供重要的基础。这项本科院校研究活动延续了研究人员此前提供的出色培训。与加州利弗莫尔的桑迪亚国家实验室的积极合作安排将继续下去。***

9510623 Roelofs The Principal Investigator will apply powerful, recently developed, atomistic methods to problems in growth and diffusion on surfaces of tungsten and molybdenum. This work will provide a theoretical basis for a better understanding of the reduction of the work function in these materials. The project includes the investigation of self diffusion via both direct and concerted modes using extended embedded atom potentials. Using molecular dynamics the investigator will simulate the fabrication method used to produce dense arrays of sharp field emitter tips. Such calculations will provide an important basis for applications to the development of active illumination flat panel displays. %%% The Principal Investigator will apply powerful, recently developed, atomistic methods to problems in growth and diffusion on surfaces of tungsten and molybdenum. Such calculations will provide an important basis for applications to the development of active illumination flat panel displays (as in lap-top computers, for example) to replace liquid crystal technology. This Research in Undergraduate Institutions activity continues the excellent training that the investigator has provided previously. An active collaborative arrangement with Sandia National Laboratory in Livermore, CA will continue. ***