SBIR PHASE I: Low Cost and Ultra-High Precision Position Sensing System for Microelectronics Manufacture

SBIR 第一阶段：用于微电子制造的低成本超高精度位置传感系统

• 批准号: 9561716
• 负责人: Tetsuo Ohara
• 金额: $ 7.24万
• 依托单位: NanoWave
• 依托单位国家: 美国
• 项目类别: Standard Grant
• 财政年份: 1996
• 资助国家: 美国
• 起止时间: 1996-03-01 至 1996-09-30
• 项目状态: 已结题
• 来源: https://www.nsf.gov/awardsearch/showAward?AWD_ID=9561716&HistoricalAwards=false
• 关键词: SBIR; PHASE; Low; Cost; Ultra

This Small Business Innovation Research (SBIR) Phase I project will investigate an ultra high-precision position sensing system, intended for next generation microelectronics production. Before a product prototype of this system can be developed, which is suitable for rigorous use in commercial manufacturing, design issues related to reliability, high speed capability, and manufacturability must be solved. The new system uses scanning probe microscope (SPM) technology and some reference scale such as a synthetic grating or an atomic layer of crystal. This unique combination, together with synchronized signal detection, is an innovation in the area of ultra high precision position sensing, which is basic to high precision positioning systems (XY stage control) in microelectronics manufacturing. Subnanometer precision (repeatability) has been demonstrated both in the height and lateral direction. Phase I will study the system design which fully utilizes the integrated micromachined sensor probe and actuator, establishing a dynamic model. Three areas of application are anticipated in commercial microelectronics manufacturing: 1)steppers, electron/ion beam lithography systems, mask aligners, and inspection systems for X-ray lithography; 2)inspection and manufacturing systems of high-precision X-ray optics and other high precision machining systems; and 3)servo writer control systems for computer hard disk and optical disk mass memory.

该小型企业创新研究（SBIR）第一阶段项目将研究一种用于下一代微电子生产的超高精度位置传感系统。 在此系统的产品原型可以开发，这是适合于严格的商业制造中使用，设计问题的可靠性，高速能力，和可制造性必须解决。 新系统采用扫描探针显微镜（SPM）技术和一些参考尺度，如合成光栅或晶体原子层。 这种独特的组合，加上同步信号检测，是超高精度位置传感领域的创新，这是微电子制造中高精度定位系统（XY平台控制）的基础。 亚纳米精度（可重复性）已被证明在高度和横向方向。 第一阶段将研究充分利用集成微机械传感器探头和致动器的系统设计，建立动态模型。 在商业微电子制造中，预计有三个应用领域：1）步进机、电子/离子束光刻系统、掩模对准器和X射线光刻的检查系统; 2）高精度X射线光学和其他高精度加工系统的检查和制造系统; 3）计算机硬盘和光盘大容量存储器的伺服写入器控制系统。