Radiation and Scattering from Antennas or Objects Within Advanced Artificial Materials.

先进人造材料中的天线或物体的辐射和散射。

• 批准号: 9614469
• 负责人: H.Y. David Yang
• 金额: $ 13万
• 依托单位: University of Illinois at Chicago
• 依托单位国家: 美国
• 项目类别: Standard Grant
• 财政年份: 1998
• 资助国家: 美国
• 起止时间: 1998-07-15 至 2000-08-31
• 项目状态: 已结题
• 来源: https://www.nsf.gov/awardsearch/showAward?AWD_ID=9614469&HistoricalAwards=false
• 关键词: Radiation; Scattering; Antennas; Objects; Within

9614469YangApplications of advanced artificial composite materials, in which photonic bands and band-gaps can be controlled though an external current, voltage bias or light source, require that implant sizes and lattice constants be comparable to at least a wavelength. For these cases, conventional effective medium approaches are inadequate. In this research, a double vector-integral equation (DOVIE) method for modeling of radiators and scatterers within advanced dielectric materials is proposed for first time development and implementation. The first integral equation formulation is to find the electromagnetic fields within the implants due to an array of sources. The second integral equation formulation is to find the currents or fields at the antennas or scatterers. The DOVIE methodology applies to general periodic structures with abnormalities, and will allow investigation of many interesting new phenomena of printed circuits and antennas involving advanced artificial materials. Expected applications include printed antennas with high directivity, high gain, multifunctionality and beam steering through controllable artificial material overlay; electromagnetic shielding provided by photonic band-gap material coatings on millimeter wave integrated circuits in which the conductor is too lossy for a desired frequency range (potentially very useful in integrated circuits); and DOVIE + CAD design of specialty integrated circuit components such as filters, directional couplers and interconnects.

先进的人造复合材料的应用，其中光子带和带隙可以通过外部电流、电压偏置或光源来控制，要求植入物尺寸和晶格常数与至少一个波长相当。 对于这些情况，传统的有效介质方法是不够的。 在这项研究中，一个双矢量积分方程（DOVIE）的先进的电介质材料内的辐射器和散射体建模方法提出了第一次开发和实施。 第一个积分方程公式是找到植入物内的电磁场，由于一系列的源。 第二个积分方程公式是找到天线或散射体处的电流或场。 DOVIE方法适用于一般的周期性结构异常，并将允许调查许多有趣的新现象的印刷电路和天线涉及先进的人工材料。 预期的应用包括具有高方向性、高增益、多功能和通过可控人造材料覆盖的波束转向的印刷天线;在导体对于期望的频率范围而言损耗太大的毫米波集成电路上由光子带隙材料涂层提供的电磁屏蔽（在集成电路中可能非常有用）;以及专用集成电路部件（例如滤波器、定向耦合器和互连）的DOVIE + CAD设计。