Tribochemical Polishing of Silicon-Based Ceramics

硅基陶瓷的摩擦化学抛光

• 批准号: 9713711
• 负责人: Traugott Fischer
• 金额: $ 9.89万
• 依托单位: Stevens Institute of Technology
• 依托单位国家: 美国
• 项目类别: Standard Grant
• 财政年份: 1997
• 资助国家: 美国
• 起止时间: 1997-09-15 至 1999-09-30
• 项目状态: 已结题
• 来源: https://www.nsf.gov/awardsearch/showAward?AWD_ID=9713711&HistoricalAwards=false
• 关键词: Tribochemical; Polishing; Silicon; Based; Ceramics

9713711 Fischer A study of the tribochemical polishing of silicon will be undertaken. The objective is to find a more environmentally acceptable polishing medium than the currently used chromium oxide and to improve the tribochemical polishing of surfaces consisting of different materials deposited on silicon wafers, such as they are encountered in the fabrication of integrated circuits. The study will involve a close examination of the polishing mechanisms involving chromium oxide and the related friction-activated surface reactions as well as a study of the chemical characteristics of the polishing fluids and their effect on polishing performance. ***

9713711 Fischer将进行硅的摩擦化学抛光的研究。 目的是找到比目前使用的氧化铬更环保的抛光介质，并改善由沉积在硅晶片上的不同材料组成的表面的摩擦化学抛光，例如它们在集成电路的制造中遇到的。 这项研究将涉及一个涉及氧化铬和相关的摩擦活化表面反应的抛光机制，以及抛光液的化学特性和它们对抛光性能的影响的研究密切检查。 ***