Tribochemical Polishing of Silicon-Based Ceramics

9713711 Fischer将对硅的摩擦化学抛光进行研究。目标是找到一种比目前使用的氧化铬更环保的抛光介质，并改进由沉积在硅片上的不同材料组成的表面的摩擦化学抛光，例如在集成电路制造中遇到的材料。这项研究将包括对涉及氧化铬和相关摩擦激活表面反应的抛光机制的仔细检查，以及抛光液的化学特性及其对抛光性能的影响的研究。* * *

9713711 Fischer A study of the tribochemical polishing of silicon will be undertaken. The objective is to find a more environmentally acceptable polishing medium than the currently used chromium oxide and to improve the tribochemical polishing of surfaces consisting of different materials deposited on silicon wafers, such as they are encountered in the fabrication of integrated circuits. The study will involve a close examination of the polishing mechanisms involving chromium oxide and the related friction-activated surface reactions as well as a study of the chemical characteristics of the polishing fluids and their effect on polishing performance. ***