Reactions of CH3 and C1 on Cu/Si Model Alloy Surfaces: Understanding the Direct Synthesis

CH3 和 C1 在 Cu/Si 模型合金表面上的反应：了解直接合成

• 批准号: 9732798
• 负责人: Daniel Strongin
• 金额: $ 50万
• 依托单位: Temple University
• 依托单位国家: 美国
• 项目类别: Standard Grant
• 财政年份: 1998
• 资助国家: 美国
• 起止时间: 1998-06-15 至 2002-05-31
• 项目状态: 已结题
• 来源: https://www.nsf.gov/awardsearch/showAward?AWD_ID=9732798&HistoricalAwards=false
• 关键词: Reactions; CH3; C1; Cu; Si

This research project, supported by the Analytical and Surface Chemistry Program and the Grant Opportunities for Academic Liaison with Industry (GOALI) program, addresses the molecular level mechanisms of the direct synthesis of silicone precursors from silicon using copper catalysts, the Muller-Rochow process. The research combines UHV adsorption studies carried out at Temple University under the direction of Professor Strongin, with STM measurements of the reactant surface carried out by Professor Hinch and coworkers at Rutgers University. Scientists at Dow Corning Corporation are involved in the evaluation of reaction kinetics and selectivity of the catalysts designed by the group based on the results of the molecular level investigations of reaction mechanism. Understanding gained from these studies is applied directly in the predictive design of catalysts for the Muller-Rochow process. The information gained from this work will have a direct impact on the commercially important silicones industry. The investigation of the molecular level mechanism of the direct synthesis of silicone precursors on Cu/Si surfaces is the focus of this research project. A combination of basic studies of copper catalyzed adsorption, morphological studies of the reacting silicon surface, and kinetic studies of operating catalysts will provide information about this technologically important process. Researchers at Temple University, Rutgers University, and the Dow Corning Corporation all contribute to this research project.

该研究项目由分析和表面化学 学术界与工业界联系的计划和资助机会 （GOALI）计划，解决了直接的分子水平的机制， 使用铜催化剂由硅合成硅氧烷前体， 穆勒-罗肖法 该研究结合了特高压吸附研究 在坦普尔大学教授的指导下， Strongin，通过STM测量反应物表面， 罗格斯大学的欣奇教授和同事们。 陶氏化学的科学家 康宁公司参与了反应动力学的评估 和选择性的催化剂设计组的基础上， 反应机理的分子水平研究结果。 从这些研究中获得的理解直接应用于 用于Muller-Rochow过程的催化剂的预测设计。 的 从这项工作中获得的信息将直接影响 商业上重要的有机硅工业。 分子水平上的直接作用机理研究 在Cu/Si表面上合成有机硅前体是本文的重点。 研究项目。 结合铜催化的基础研究， 吸附，反应硅表面的形态学研究，和 催化剂的动力学研究将提供以下信息 这是一个重要的技术过程。 Temple研究人员 罗格斯大学和道康宁公司 为这个研究项目做出贡献。