Surface Finishing of Advanced Ceramic Materials in Chemically Assisted Environments

摘要 EEC-9813014 Niesz/Rutgers这是一个探索性的研究项目，以加强工业/大学合作研究中心的陶瓷研究。 它计划开发一个基本的科学和工程的理解，先进的陶瓷材料的精细表面精加工使用化学改性抛光环境。 其目的是提高表面光洁度质量，最大限度地减少表面和亚表面损伤，并提高均匀材料去除率。特别强调的是附着力和耐磨性。 要研究的抛光环境变量包括抛光溶液pH、电解质浓度和研磨材料。其它受控抛光参数将包括温度和能量输入。抛光介质将包括二氧化硅和二氧化钛、氧化锆和二氧化铈。

ABSTRACT EEC-9813014 Niesz/Rutgers This is an exploratory research project to augment the Industry/University Cooperative Research Center for Ceramics Research. It is planned to develop a fundamental scientific and engineering understanding of fine surface finishing of advanced ceramic material using chemically modified polishing environments. The objective is to improve surface finish quality, minimize surface and subsurface damage, and increased rate of homogeneous material removal. Special emphasis will be on adhesion and abrasion. Polishing environment variables to be studied include polishing solution pH, electrolyte concentration, and abrasive materials. Other controlled polishing parameters will include temperature and energy input. Polishing media will include silica and titania, zirconia and ceria.