Synthesis and Characterization of Carbon Coatings in the Surface of Carbides Produced by Etching in Halogens

卤素蚀刻碳化物表面碳涂层的合成与表征

• 批准号: 9813400
• 负责人: Michael McNallan
• 金额: $ 25.5万
• 依托单位: University of Illinois at Chicago
• 依托单位国家: 美国
• 项目类别: Standard Grant
• 财政年份: 1998
• 资助国家: 美国
• 起止时间: 1998-09-01 至 2001-08-31
• 项目状态: 已结题
• 来源: https://www.nsf.gov/awardsearch/showAward?AWD_ID=9813400&HistoricalAwards=false
• 关键词: Synthesis; Characterization; Carbon; Coatings; Surface

Under an SGER award the PI has recently demonstrated the feasibility of synthesizing carbon coatings on silcon carbide surfaces by removing the silicon with a halogen etch in a high temperature reactor. This project will study the fundamental nature of the process to determine the mechanisms of carbon-carbon self assembly, the various structures grown as a functioon of process conditions, and the thermodynamics of formation and the kinetics of growth. The conditions for formation of diamond, diamond-like, amorphous carbon, and graphite layers will be determined. Some of the chemical, mechanical and tribological properties of the films will be evaluated as well as their suitability as interface layers for CVD deposition of carbon films.

在SGER奖下，PI最近证明了通过在高温反应器中用卤素蚀刻去除硅来在碳化硅表面合成碳涂层的可行性。本项目将研究该过程的基本性质，以确定碳-碳自组装的机制，作为过程条件的函数生长的各种结构，以及形成的热力学和生长的动力学。将确定形成金刚石、类金刚石、无定形碳和石墨层的条件。一些膜的化学，机械和摩擦学性能将被评估，以及它们作为CVD沉积碳膜的界面层的适用性。