SBIR Phase I: In-Situ Characterization of Photoresist Properties by Fourier Transform Infrared Based IR Spectroscopy

9860798小型企业创新研究第一阶段将开发一种基于FTIR的串联传感器，用于监测用于半导体行业先进亚微米光刻技术的新型深紫外光化学放大抗蚀剂材料的化学成分。将开发一种直接集成在商用光刻组合工具上的新型傅里叶变换红外显微镜，该显微镜将在工艺步骤之间提供关于抗蚀剂化学的快速数据。该传感器将结合光学和为光致抗蚀剂化学分析量身定做的算法。建议的技术将使人们更好地了解用于半导体设备亚微米光刻的新型化学放大抗蚀剂，这将缩短工艺和产品开发时间，提高成品率，并可能对光刻应用进行闭环工艺控制。

9860798 This Small Business Innovation Research Phase I will develop an in-line, FTIR-based sensor to monitor the chemistry of new deep ultraviolet chemically amplified resist materials used for advanced submicron photolithography in the semiconductor industry. A novel Fourier Transform InfraRed microscope integrated directly upon a commercial lithographic cluster tool will be developed that will provide rapid data on the resist chemistry between process steps. The sensor will incorporate optics and algorithms tailored to the analysis of photoresist chemistry. The proposed technology will lead to improved understanding of new, chemically amplified resists used for sub-micron lithography of semiconductor devices, which will lead to decreased process and product development times, higher yields and potentially closed-loop process control for lithographic applications.