SBIR Phase I: In-Situ Characterization of Photoresist Properties by Fourier Transform Infrared Based IR Spectroscopy

点击翻译按钮获取中文摘要

9860798 This Small Business Innovation Research Phase I will develop an in-line, FTIR-based sensor to monitor the chemistry of new deep ultraviolet chemically amplified resist materials used for advanced submicron photolithography in the semiconductor industry. A novel Fourier Transform InfraRed microscope integrated directly upon a commercial lithographic cluster tool will be developed that will provide rapid data on the resist chemistry between process steps. The sensor will incorporate optics and algorithms tailored to the analysis of photoresist chemistry. The proposed technology will lead to improved understanding of new, chemically amplified resists used for sub-micron lithography of semiconductor devices, which will lead to decreased process and product development times, higher yields and potentially closed-loop process control for lithographic applications.