Symposium J: Advanced Materials and Techniques for Nanolithography, Boston MA

研讨会 J：纳米光刻先进材料和技术，马萨诸塞州波士顿

• 批准号: 9986520
• 负责人: Robert Pachavis
• 金额: $ 0.5万
• 依托单位: Materials Research Society
• 依托单位国家: 美国
• 项目类别: Standard Grant
• 财政年份: 2000
• 资助国家: 美国
• 起止时间: 2000-01-15 至 2000-12-31
• 项目状态: 已结题
• 来源: https://www.nsf.gov/awardsearch/showAward?AWD_ID=9986520&HistoricalAwards=false
• 关键词: Symposium; Advanced; Materials; Techniques; Nanolithography

A symposium will be held in December, 1999 on Advanced Materials and Techniques for Nanolithography at the Fall MRS meeting in Boston. The symposium focuses on the material science aspect of lithographic processes including the development of advanced resists and more generally of smart materials. Lithography optimization potential through greater materials science understanding is comparatively very high and should help in breaking the sub-100 nm critical dimension in microelectronics. This crossdisciplinary symposium is aimed at bringing together experts working in all areas of nanolithography as well as material science researchers expert in new materials design.The symposium seeks to attract participants from industry, academia, and government laboratories, to help these communities learn from each other. It provides a stimulating environment for students planning a career in electronic materials, a field of research that is exciting, and is important to the national economy. Support from NSF will be used to partially compensate young scientists (junior faculty, graduate students and postdoctoral fellows) for travel and accommodation expenses. The symposium is expected to provide an effective forum for discussion of critical scientific issues in advanced nanolithography. Along with the opportunity to assess the field and future directions, it is expected that new ties will be established between universities, research institutions, and industry. %%%Nanolithography and electronic/photonic materials have far reaching economic potential since applications range broadly across computing, communications, and information processing. An evaluation of the progress and status of this field along with current assessments of the most important developments will be of great value to the understanding and enhanced utilization of advanced materials in applications beneficial to society. ***

1999年12月，在波士顿举行的秋季MRS会议上将举行一次关于纳米光刻先进材料和技术的研讨会。研讨会的重点是光刻工艺的材料科学方面，包括先进的抗蚀剂和更普遍的智能材料的发展。通过更深入的材料科学理解，光刻优化潜力相对非常高，应该有助于突破微电子领域的亚100 nm临界尺寸。本次跨学科研讨会旨在汇集纳米光刻各个领域的专家以及新材料设计方面的材料科学研究人员。研讨会旨在吸引来自工业界、学术界和政府实验室的参与者，以帮助这些社区相互学习。 它为计划从事电子材料职业的学生提供了一个刺激的环境，这是一个令人兴奋的研究领域，对国民经济非常重要。NSF的支持将用于部分补偿年轻科学家（初级教师，研究生和博士后研究员）的旅行和住宿费用。预计研讨会将提供一个有效的论坛，讨论先进的纳米光刻关键的科学问题。 沿着评估该领域和未来方向的机会，预计大学、研究机构和工业界之间将建立新的联系。 纳米光刻和电子/光子材料具有深远的经济潜力，因为其应用范围广泛，涉及计算、通信和信息处理。对这一领域的进展和现状的评价沿着对最重要的发展的当前评估，将对理解和提高先进材料在有益于社会的应用中的利用具有重要价值。***