Symposium J: Advanced Materials and Techniques for Nanolithography, Boston MA
Symposium J: Advanced Materials and Techniques for Nanolithography, Boston MA
批准号:
9986520
负责人:
Robert Pachavis
金额:
$0.5万
依托单位国家:
美国
项目类别:
Standard Grant
财政年份:
2000
资助国家:
美国
项目状态:
已结题
起止时间:
2000-01-15 至 2000-12-31
中文摘要
在波士顿举行的秋季MRS会议上,将于1999年12月举行关于纳米光刻的先进材料和技术的研讨会。研讨会的重点是光刻工艺的材料科学方面,包括先进抗蚀剂的开发,以及更广泛的智能材料的开发。通过对材料科学的更多了解,光刻优化的潜力相对很高,应该有助于打破微电子学中亚100 nm的临界尺寸。这个跨学科的研讨会旨在汇聚纳米光刻各个领域的专家以及新材料设计方面的材料科学研究人员。研讨会旨在吸引来自工业界、学术界和政府实验室的参与者,以帮助这些社区相互学习。它为计划在电子材料领域谋生的学生提供了一个刺激的环境,这是一个令人兴奋的研究领域,对国民经济很重要。NSF的支持将用于部分补偿年轻科学家(初级教师、研究生和博士后研究员)的旅费和住宿费。研讨会预计将为讨论先进纳米光刻的关键科学问题提供一个有效的论坛。随着评估该领域和未来方向的机会,预计大学、研究机构和行业之间将建立新的联系。纳米光刻和电子/光子材料具有深远的经济潜力,因为其应用范围广泛,涉及计算、通信和信息处理。评估这一领域的进展和现状,以及目前对最重要的事态发展的评估,将对理解和加强先进材料在有益于社会的应用中的利用具有重要价值。***
英文摘要
A symposium will be held in December, 1999 on Advanced Materials and Techniques for Nanolithography at the Fall MRS meeting in Boston. The symposium focuses on the material science aspect of lithographic processes including the development of advanced resists and more generally of smart materials. Lithography optimization potential through greater materials science understanding is comparatively very high and should help in breaking the sub-100 nm critical dimension in microelectronics. This crossdisciplinary symposium is aimed at bringing together experts working in all areas of nanolithography as well as material science researchers expert in new materials design.The symposium seeks to attract participants from industry, academia, and government laboratories, to help these communities learn from each other. It provides a stimulating environment for students planning a career in electronic materials, a field of research that is exciting, and is important to the national economy. Support from NSF will be used to partially compensate young scientists (junior faculty, graduate students and postdoctoral fellows) for travel and accommodation expenses. The symposium is expected to provide an effective forum for discussion of critical scientific issues in advanced nanolithography. Along with the opportunity to assess the field and future directions, it is expected that new ties will be established between universities, research institutions, and industry. %%%Nanolithography and electronic/photonic materials have far reaching economic potential since applications range broadly across computing, communications, and information processing. An evaluation of the progress and status of this field along with current assessments of the most important developments will be of great value to the understanding and enhanced utilization of advanced materials in applications beneficial to society. ***
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批准号:0814658
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资助金额:$1.2万
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批准号:0737634
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依托单位:
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批准号:0738610
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项目类别:Standard Grant
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资助金额:$0.5万
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财政年份:2007
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负责人:Robert Pachavis
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批准号:0647449
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资助金额:$0.5万
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财政年份:2007
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负责人:Robert Pachavis
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依托单位:
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批准号:0710495
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项目类别:Standard Grant
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资助金额:$0.3万
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财政年份:2007
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依托单位:
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批准号:0633463
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依托单位:
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批准号:0632866
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项目类别:Standard Grant
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资助金额:$1.8万
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财政年份:2006
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负责人:Robert Pachavis
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依托单位:
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批准号:0527291
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项目类别:Standard Grant
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资助金额:$0.5万
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财政年份:2005
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负责人:Robert Pachavis
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依托单位:
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批准号:0539509
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项目类别:Standard Grant
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资助金额:$0.5万
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财政年份:2005
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负责人:Robert Pachavis
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依托单位:
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项目类别:Standard Grant
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资助金额:$1.8万
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批准号:0443163
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项目类别:Standard Grant
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资助金额:$16.0万
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负责人:Robert Pachavis
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项目类别:Standard Grant
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资助金额:$0.2万
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财政年份:2004
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负责人:Robert Pachavis
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依托单位:
国内基金
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