Symposium D "Non-Lithographic & Lithographic Methods for Nanofabrication: from ULSI to Photonics to Molecular Electronics"; Boston, MA; November 27-December 1, 2000.

研讨会D“非光刻

• 批准号: 0083307
• 负责人: Robert Pachavis
• 金额: $ 0.31万
• 依托单位: Materials Research Society
• 依托单位国家: 美国
• 项目类别: Standard Grant
• 财政年份: 2000
• 资助国家: 美国
• 起止时间: 2000-09-01 至 2001-08-31
• 项目状态: 已结题
• 来源: https://www.nsf.gov/awardsearch/showAward?AWD_ID=0083307&HistoricalAwards=false
• 关键词: Symposium; Non; Lithographic; & Methods

The Materials Research Society symposium on Non-Lithographic & Lithographic Methods for Nanofabrication: from ULSI to Photonics to Molecular Electronics will address the materials science, chemistry, physics, and biology of micro- and nanoscale structures including potential applications areas. In addition to the materials science and physics of these nanoscale systems, the symposium will include a discussion of techniques such as self-assembly and lithographic methods as fabrication tools for building structures with micron and nanometer feature sizes, and novel and emerging devices that rely on structures with submicron dimensions. %%%Nanostructured materials often display chemical and physical properties distinctly different from their corresponding bulk materials. Nanotechnology areas such as electronic, photonic and catalytic materials nanostructures exhibiting novel properties for various applications are currently viewed as high priorities within industry. Preference for NSF support to participate in this symposium will be given to students, postdocs, and faculty who are early in their careers who may otherwise find it difficult to to travel to this conference.

材料研究学会非光刻和光刻纳米制造方法研讨会：从ULSI到光子学到分子电子学，将讨论微纳米结构的材料科学、化学、物理和生物学，包括潜在的应用领域。除了这些纳米级系统的材料科学和物理学之外，研讨会还将讨论自组装和光刻方法等技术，作为构建微米和纳米特征尺寸结构的制造工具，以及依赖于亚微米尺寸结构的新型和新兴设备。纳米结构材料通常表现出与其相应的块状材料截然不同的化学和物理性质。纳米技术领域，如电子、光子和催化材料，纳米结构在各种应用中表现出新的特性，目前被视为工业领域的重中之重。美国国家科学基金会将优先支持参加本次研讨会的学生、博士后和教师，他们处于职业生涯的早期，否则可能难以前往参加本次会议。