NER: Combined NIL and ESA Processing of Electro-Optic Materials

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ABSTRACT NSF Proposal #0102648 Combined NIL and ESA Processing of Electro-Optic Materials Richard O. Claus, Virginia Tech, PI This NSF NER program will study polymer/dielectric nanocomposites with enhanced electro-optical modulation efficiency and thermal stability, by using a combination of electrostatic self-assembly (ESA) facilities at Virginia Tech and nanoimprint lithography (NIL) facilities at the University of Michigan. We will use NIL to create a base nanopatterned template and ESA to fill in the template through the molecular-level assembly of dipolar molecules. This combination of approaches would allow the potentially low-cost manufacturing of optical and electro-optic materials and devices. The program will allow us to explore fundamental issues involving nanopatterning, molecular alignment, and structure/property relationships in resulting prototype device materials.