NER: Combined NIL and ESA Processing of Electro-Optic Materials

摘要美国国家科学基金会提案#0102648将电光材料的零接触和欧空局加工结合在一起。理查德·O·克劳斯、弗吉尼亚理工学院、皮埃里这个国家科学基金会的NER计划将利用弗吉尼亚理工学院的静电自组装(ESA)设施和密歇根大学的纳米压印光刻(NIL)设施的组合，研究具有增强的电光调制效率和热稳定性的聚合物/介电纳米复合材料。我们将使用NIL来创建碱基纳米颗粒模板，并使用ESA通过偶极分子的分子级组装来填充模板。这种方法的结合将允许以潜在的低成本制造光学和电光材料和设备。该计划将使我们能够探索所产生的原型器件材料中涉及纳米颗粒、分子排列和结构/性能关系的基本问题。

ABSTRACT NSF Proposal #0102648 Combined NIL and ESA Processing of Electro-Optic Materials Richard O. Claus, Virginia Tech, PI This NSF NER program will study polymer/dielectric nanocomposites with enhanced electro-optical modulation efficiency and thermal stability, by using a combination of electrostatic self-assembly (ESA) facilities at Virginia Tech and nanoimprint lithography (NIL) facilities at the University of Michigan. We will use NIL to create a base nanopatterned template and ESA to fill in the template through the molecular-level assembly of dipolar molecules. This combination of approaches would allow the potentially low-cost manufacturing of optical and electro-optic materials and devices. The program will allow us to explore fundamental issues involving nanopatterning, molecular alignment, and structure/property relationships in resulting prototype device materials.