NER: Combined NIL and ESA Processing of Electro-Optic Materials

NER：电光材料的 NIL 和 ESA 组合处理

• 批准号: 0102648
• 负责人: Richard Claus
• 金额: $ 10万
• 依托单位: Virginia Polytechnic Institute and State University
• 依托单位国家: 美国
• 项目类别: Standard Grant
• 财政年份: 2001
• 资助国家: 美国
• 起止时间: 2001-08-01 至 2003-01-31
• 项目状态: 已结题
• 来源: https://www.nsf.gov/awardsearch/showAward?AWD_ID=0102648&HistoricalAwards=false
• 关键词: NER; Combined; NIL; ESA; Processing

ABSTRACT NSF Proposal #0102648 Combined NIL and ESA Processing of Electro-Optic Materials Richard O. Claus, Virginia Tech, PI This NSF NER program will study polymer/dielectric nanocomposites with enhanced electro-optical modulation efficiency and thermal stability, by using a combination of electrostatic self-assembly (ESA) facilities at Virginia Tech and nanoimprint lithography (NIL) facilities at the University of Michigan. We will use NIL to create a base nanopatterned template and ESA to fill in the template through the molecular-level assembly of dipolar molecules. This combination of approaches would allow the potentially low-cost manufacturing of optical and electro-optic materials and devices. The program will allow us to explore fundamental issues involving nanopatterning, molecular alignment, and structure/property relationships in resulting prototype device materials.

摘要NSF提案#0102648电光材料的NIL和ESA联合处理克劳斯，弗吉尼亚理工大学，PI这个NSF NER计划将研究具有增强的电光调制效率和热稳定性的聚合物/电介质纳米复合材料，通过使用弗吉尼亚理工大学的静电自组装（ESA）设施和密歇根大学的纳米压印光刻（NIL）设施的组合。我们将使用NIL来创建基础纳米图案化模板，并使用ESA通过偶极分子的分子水平组装来填充模板。这种方法的组合将允许光学和电光材料和器件的潜在低成本制造。该计划将使我们能够探索涉及纳米图案化，分子排列和结构/性能关系的基本问题，从而产生原型器件材料。