SBIR Phase I: Low-Temperature, Low-Cost Manufacture of Oxide Thin Films

SBIR 第一阶段：氧化物薄膜的低温、低成本制造

• 批准号: 0128677
• 负责人: Thomas Reynolds
• 金额: $ 10万
• 依托单位: REYTECH CORPORATION
• 依托单位国家: 美国
• 项目类别: Standard Grant
• 财政年份: 2002
• 资助国家: 美国
• 起止时间: 2002-01-01 至 2002-06-30
• 项目状态: 已结题
• 来源: https://www.nsf.gov/awardsearch/showAward?AWD_ID=0128677&HistoricalAwards=false
• 关键词: SBIR; Phase; Low; Temperature; Cost

This Small Business Innovation Research Phase I project will develop a rapid, low-cost, low-temperature, scalable, environmentally benign method for the deposition of crystalline oxide thin films. The specific Phase I goals are to demonstrate the feasibility of developing procedures for growing these specific high-quality thin-film crystals and to evaluate their crystal structure, optical properties and texture. The commercial benefits of this type of processing method would revolutionize applications ranging from electronics to medicine to energy.

这个小企业创新研究一期项目将开发一种快速、低成本、低温、可扩展、环保的结晶氧化薄膜沉积方法。第一阶段的具体目标是证明开发这些特定高质量薄膜晶体的方法的可行性，并评估它们的晶体结构、光学性质和纹理。这种处理方法的商业效益将彻底改变从电子到医学到能源的应用。