Elementary Reactions of Hyperthermal Gas-Phase Oxygen Atoms with Atomic Adsorbates on Si(100)-(2x1): Mechanisms and Kinetics

本提案的目的是确定超高温，气相氧原子与吸附在单晶硅上的原子的非热反应的基本机制和动力学。 一种新型的超高温原子氧束源将被用来刺激在吸附改性的硅表面的反应。 在原子-吸附物反应期间，将使用质谱法监测解吸反应产物。 将使用热脱附、X射线光电子和俄歇电子能谱研究保持吸附在表面上的反应产物和表面的化学变化。 超高温，气相氧原子与吸附的氧，氮，碳和氘原子的反应将与这些技术进行研究，以确定吸附层结构和键合能量的基本机制，动力学和反应的选择性的影响。 该项目的结果将促进目前对基本原子-吸附物反应的理解。 教育部分是指导研究生和本科生。 研究生将在一个领域进行培训，该领域将对对多相化学感兴趣的行业，特别是半导体行业感兴趣。这项工作的结果可能会对我们理解半导体行业的工艺产生重大影响，包括等离子体处理。

The objective of this proposal is to determine the elementary mechanisms and kinetics governing the non-thermal reactions of hyperthermal, gas-phase oxygen atoms with atoms adsorbed on single crystal silicon. A novel beam source of hyperthermal atomic oxygen will be used to stimulate reactions at the adsorbate-modified silicon surface. The desorbing reaction products will be monitored during the atom-adsorbate reactions using mass spectrometry. The reaction products that remain adsorbed on the surface and the chemical changes of the surface will be studied using thermal desorption, x-ray photoelectron and Auger electron spectroscopy. The reactions of hyperthermal, gas-phase oxygen atoms with adsorbed oxygen, nitrogen, carbon, and deuterium atoms will be investigated with these techniques to determine the influence of adlayer structure and bonding energetics on the elementary mechanisms, kinetics, and selectivity of the reactions. Results of this project will advance the current understanding of elementary atom-adsorbate reactions. The educational component is the mentoring of graduate and undergraduate students. Graduate students will be trained in an area that will be of significant interest to industries interested in heterogeneous chemistry, especially in the semiconductor industry. The results of this work could have a significant impact on our understanding of processes in the semiconductor industry, including plasma processing.