PECASE: Spectral Directional Radiative Properties of Rough Si at Elevated Temperatures

PECASE：粗糙硅在高温下的光谱定向辐射特性9875441张卓敏这是一项NSF CAREER/PECASE资助，用于研究硅在高温下的辐射特性。首席研究员将在室温至1000℃，0.4至20微米范围内，对抛光和粗糙表面的硅晶圆进行定向辐射特性测量。研究的理论部分将强调表面粗糙度对发射率和透射率的影响。基本的机制，如载流子散射速率的温度依赖性和光子增强吸收，也将被研究。本项目测定的粗硅的辐射特性将用于详细的传热分析，以预测晶圆对辐射计和快速热处理（RTP）室的发射和反射辐射，以优化RTP室的设计。此外，还提出了一个综合教育计划，通过开发微尺度热科学计划和编写适当的教学和实验室手册来推进热科学工程教育。

PECASE: Spectral Directional Radiative Properties of Rough Si at Elevated Temperatures9875441Zhuomin ZhangThis is an NSF CAREER/PECASE grant for research on the radiative properties of silicon at elevated temperatures. The principal investigator will conduct measurements of the directional radiative properties of Si wafers with polished and rough surfaces from room temperature up to 1000 C and from 0.4 to 20 micrometers. The theoretical part of the study will emphasize the effect of surface roughness on emittance and transmittance. The fundamental mechanisms, such as the temperature dependence of the carrier scattering rate and photon-enhanced absorption, will also be investigated.The radiative properties of rough Si determined from this project will be used in a detailed heat transfer analysis to predict the emitted and reflected radiation from the wafer to the radiometer and the rapid thermal processing (RTP) chamber to optimize the RTP chamber design. In addition, an integrated educational plan is proposed to advance thermal science engineering education through the development of a microscale thermal science program and the writing of appropriate instructional and laboratory manuals.