GOALI: Chemical Factors Affecting Lifetime and Delivery of Metal-Organic Chemical Vapor Deposition Precursors: Exploring Gas and Liquid Phase Oligomerization, Decomposition, and Co

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Professor John A. Belot of the University of Nebraska Chemistry Department has submitted a new GOALI proposal for research aimed at exploring and determining oligomerization, decomposition, and contamination issues affecting the lifetime and delivery characteristics of volatile MOCVD and ALD precursors for metal oxide thin films. This proposal involves collaboration between the University of Nebraska - Lincoln and Air Liquide. Ultimately, the PI's research will attempt to preclude deleterious reactivity by introducing trace stabilizing additives. Precursor stability is a critical factor which impacts manufacturability and is decisive in determining adoption of precursors for thin film growth of metal oxides by semiconductor manufacturers. The PI will study the inorganic chemistry of trace hydrolysis, aging, and concentration in select titanium, hafnium, and lanthanide homoleptic amino- and alkoxides, with the aim of improving the manufacturability and therefore the adoption of stable precursors for the deposition of oxide thin films. Undergraduate and graduate students will be exposed to real world problems and internship opportunities in a forefront research program in inorganic materials chemistry.