Plasma diagnostics of pulsed microwave plasmas with HF-bias combined with plasma-enhanced atomic layer deposition for the deposition of multilayer SiOx gradient coatings as barrier coating of flexible polymers (B04)

利用薄膜分析和等离子体定量诊断技术，研究了利用脉冲微波驱动放电和可变高频偏压在聚合物表面沉积阻挡层的基本机理。通过改变HF偏压来控制离子能量和反应物种的通量。此外，还利用等离子体增强原子层沉积(PEALD)和原子层/分子层结合沉积(ALD/MLD)制备了用于气体阻隔和膜应用的高度均匀的氧化物和杂化涂层。在这一点上，功能性质可以通过沉积过程和前驱体化学的变化来调整。

The fundamental mechanisms during the deposition of barrier coatings on polymers, by means of a pulsed microwave driven discharge and a variable HF bias, are investigated, employing thin film analysis and quantitative plasma diagnostics. Ion energies and the flux of reactive species are controlled by varying the HF bias. Furthermore, plasma enhanced atomic layer deposition (PEALD) and combined atomic layer and molecular layer depositions (ALD/MLD) are performed to deposit highly homogeneous oxide and hybrid coatings for gas barrier and membrane applications. In this regard, functional properties are tuned by variation of the deposition process and precursor chemistry.