Plasma diagnostics of pulsed microwave plasmas with HF-bias combined with plasma-enhanced atomic layer deposition for the deposition of multilayer SiOx gradient coatings as barrier coating of flexible polymers (B04)

利用薄膜分析和定量等离子体诊断技术，研究了脉冲微波驱动放电和可变高频偏压在聚合物上沉积阻挡涂层的基本机理。通过改变HF偏压来控制离子能量和反应物质的通量。此外，等离子体增强原子层沉积（PEALD）和原子层和分子层结合沉积（ALD/MLD）可以沉积高度均匀的氧化物和混合涂层，用于气体屏障和膜应用。在这方面，功能特性是由沉积工艺和前驱体化学的变化来调整的。

The fundamental mechanisms during the deposition of barrier coatings on polymers, by means of a pulsed microwave driven discharge and a variable HF bias, are investigated, employing thin film analysis and quantitative plasma diagnostics. Ion energies and the flux of reactive species are controlled by varying the HF bias. Furthermore, plasma enhanced atomic layer deposition (PEALD) and combined atomic layer and molecular layer depositions (ALD/MLD) are performed to deposit highly homogeneous oxide and hybrid coatings for gas barrier and membrane applications. In this regard, functional properties are tuned by variation of the deposition process and precursor chemistry.