Plasma diagnostics of pulsed microwave plasmas with HF-bias combined with plasma-enhanced atomic layer deposition for the deposition of multilayer SiOx gradient coatings as barrier coating of flexible polymers (B04)

高频偏压脉冲微波等离子体的等离子体诊断与等离子体增强原子层沉积相结合，用于沉积多层 SiOx 梯度涂层作为柔性聚合物的阻挡涂层 (B04)

• 批准号: 177867750
• 金额: --
• 依托单位: Institut für Materialchemie
• 依托单位国家: 德国
• 项目类别: CRC/Transregios
• 财政年份: 2010
• 资助国家: 德国
• 起止时间: 2009-12-31 至 2021-12-31
• 项目状态: 已结题
• 来源: https://gepris.dfg.de/gepris/projekt/177867750?language=en
• 关键词: Plasma; diagnostics; pulsed; microwave; plasmas

The fundamental mechanisms during the deposition of barrier coatings on polymers, by means of a pulsed microwave driven discharge and a variable HF bias, are investigated, employing thin film analysis and quantitative plasma diagnostics. Ion energies and the flux of reactive species are controlled by varying the HF bias. Furthermore, plasma enhanced atomic layer deposition (PEALD) and combined atomic layer and molecular layer depositions (ALD/MLD) are performed to deposit highly homogeneous oxide and hybrid coatings for gas barrier and membrane applications. In this regard, functional properties are tuned by variation of the deposition process and precursor chemistry.

采用薄膜分析和定量等离子体诊断技术，研究了在聚合物上沉积阻隔涂层的基本机制，即脉冲微波驱动放电和可变HF偏压。通过改变HF偏压来控制离子能量和活性物质的通量。此外，进行等离子体增强原子层沉积（PEALD）和组合的原子层和分子层沉积（ALD/MLD）以存款用于气体屏障和膜应用的高度均匀的氧化物和混合涂层。在这方面，通过改变沉积工艺和前体化学来调节功能特性。