SBIR Phase I: Novel Ion Source for Enhanced Focused Ion Beam Material Removal at the Nano, Micro and Macro-Scales

SBIR 第一阶段：用于增强聚焦离子束纳米、微米和宏观尺度材料去除的新型离子源

• 批准号: 0741150
• 负责人: Noel Smith
• 金额: $ 10万
• 依托单位: Oregon Physics LLC
• 依托单位国家: 美国
• 项目类别: Standard Grant
• 财政年份: 2008
• 资助国家: 美国
• 起止时间: 2008-01-01 至 2008-06-30
• 项目状态: 已结题
• 来源: https://www.nsf.gov/awardsearch/showAward?AWD_ID=0741150&HistoricalAwards=false
• 关键词: SBIR; Phase; Novel; Ion; Source

This Small Business Innovation Research (SBIR) Phase I research project will investigate the feasibility of increasing the spectral brightness of a plasma ion source by miniaturizing the plasma size and improving the energy transfer to the source with a poly-phase RF antenna. This new ion source will extend the range of focused ion beam machining tools from the nano-scale where today?s focused ion beams (FIBs) are practically used, to the micro-scale and macro-scale. FIB tools are used for nanometer scale precision material removal. The benefits of FIB tools include nanoscale beam placement accuracy, a combined imaging and patterning system for accurate part registration and pattern placement, and low structural damage of the area surrounding the removed volume. The development of this new ion source would have a broad impact in enabling FIB systems to remove material at the nano, micro, and macro scales with material removal rates that are suitable to the different length scales. The broader impact/commercial potential from the technology will be a new ion source that would have a broad impact in enabling FIB systems to remove material at the nano, micro, and macro scales with material removal rates that are suitable to the different length scales. This technology would also have a broad impact in other areas that use ion sources such as secondary ion mass spectrometry (SIMS) instruments and ion accelerators for high energy physics. The new source could be used to improve SIMS imaging resolution to the theoretical limit of approximately 10 nano-meters.

该小型企业创新研究（SBIR）第一阶段研究项目将研究通过使用多相RF天线增加等离子体尺寸和改善能量传输到源来增加等离子体离子源光谱亮度的可行性。这种新的离子源将扩大聚焦离子束加工工具的范围，从纳米级的今天在哪里？s聚焦离子束（FIB）在微观和宏观尺度上都有实际应用。FIB工具用于纳米级精密材料去除。FIB工具的优点包括纳米级射束放置精度、用于精确部件配准和图案放置的组合成像和图案化系统以及去除体积周围区域的低结构损伤。这种新离子源的开发将在使FIB系统能够以适合于不同长度尺度的材料去除速率在纳米、微米和宏观尺度上去除材料方面产生广泛的影响。该技术更广泛的影响/商业潜力将是一种新的离子源，它将对FIB系统在纳米、微米和宏观尺度上去除材料产生广泛的影响，其材料去除率适合于不同的长度尺度。这项技术也将在使用离子源的其他领域产生广泛的影响，如二次离子质谱仪（西姆斯）仪器和高能物理的离子加速器。这种新的光源可以用来提高西姆斯成像分辨率，理论上可以达到10纳米。