Support for US Scholars and Students to Participate in the 5th International Symposium on Nanomanufacturing, January 2008, Singapore

支持美国学者和学生参加第五届国际纳米制造研讨会，2008年1月，新加坡

• 批准号: 0751414
• 负责人: Martin Culpepper
• 金额: $ 3.98万
• 依托单位: Massachusetts Institute of Technology
• 依托单位国家: 美国
• 项目类别: Standard Grant
• 财政年份: 2008
• 资助国家: 美国
• 起止时间: 2008-02-01 至 2009-01-31
• 项目状态: 已结题
• 来源: https://www.nsf.gov/awardsearch/showAward?AWD_ID=0751414&HistoricalAwards=false
• 关键词: Support; US; Scholars; Students; Participate

This travel grant is to enable U.S. scholars to travel to, and attend, the 5th International Symposium on Nanomanufacturing (ISNM) that will take place in Singapore from Jan. 23 - Jan. 25. The ISNM serves as the world's leading forum in which scholars, engineers and members of the business community discuss research, education and applications in Nanomanufacturing. Travel support will be provided mainly to African American and women scholars, particularly those who are establishing their careers in nanomanufacturing. It will also enable U.S. students to participate in a nano-design contest, in which students will compete to design a nano-positioning stage.Maintaining US leadership in nanomanufacturing is important to the national interest. The broader impacts of this grant will occur via the education and experiences that attendees gain at the symposium. More specifically, early career scholars will enrich their knowledge of the state-of-the-art in their area of technical expertise and complimentary fields, observe how established researchers communicate ideas, network and form seeds for research/education collaboration, take part in discussions about improving nanomanufacturing education and thereby diversify the perspectives that are heard, gain experience in technical communication via posters and oral presentation of their research, and participate in an engineering design competition with students from other countries. Other tangible benefits include the rapid dissemination of nanomanufacturing science into the U.S. academic/engineering community, continued recognition of U.S. leadership in the field, and continued increase in the participation of scholars from underrepresented groups.

这项旅行资助是为了使美国学者能够前往并参加将于1月23日至1月25日在新加坡举行的第五届纳米制造国际研讨会（ISNM）。ISNM是世界领先的论坛，学者、工程师和商界成员在此讨论纳米制造的研究、教育和应用。旅行支持将主要提供给非裔美国人和女性学者，特别是那些正在纳米制造领域建立自己职业生涯的学者。它还将使美国学生参加纳米设计竞赛，学生们将在竞赛中设计纳米定位舞台。保持美国在纳米制造领域的领导地位对国家利益至关重要。这项奖助金的广泛影响将透过参加者在研讨会上获得的教育和经验而产生。更具体地说，早期职业学者将丰富他们在其技术专长和互补领域的最新技术知识，观察成熟的研究人员如何交流思想，建立网络并形成研究/教育合作的种子，参与有关改进纳米制造教育的讨论，从而使所听到的观点多样化，通过海报和口头展示他们的研究获得技术交流的经验。并与其他国家的学生一起参加工程设计竞赛。其他切实的好处包括纳米制造科学在美国学术界/工程界的迅速传播，美国在该领域的领导地位得到持续认可，以及来自代表性不足群体的学者的参与不断增加。