2009 MRS Symposium BB, "Material Systems and Processes for 3D Micro- and Nanoscale Fabrication & Lithography," San Francisco, CA; April 14 - 16, 2009

2009 年 MRS 研讨会 BB，“3D 微米和纳米级制造的材料系统和工艺

• 批准号: 0917832
• 负责人: Paula Mammarella
• 金额: --
• 依托单位: Materials Research Society
• 依托单位国家: 美国
• 项目类别: Standard Grant
• 财政年份: 2009
• 资助国家: 美国
• 起止时间: 2009-04-01 至 2010-03-31
• 项目状态: 已结题
• 来源: https://www.nsf.gov/awardsearch/showAward?AWD_ID=0917832&HistoricalAwards=false
• 关键词: 2009; MRS; Symposium; BB; Material

ID: MPS/DMR/BMAT(7623) 0917832 PI: Mammarella, Paula ORG: Materials Research SocietyTitle: MRS Symposium BB on Materials Systems and Processes for 3D Micro- and Nanoscale Fabrication and LithographyINTELLECTUAL MERIT: This Materials Research Society Symposium will provide a forum for presenting and discussing the latest discoveries in material systems and processes for 3D microfabrication and their application for preparing functional 3D micro- and nanoscale devices. The growing interest in 3D fabrication and assembly approaches stems from the shortcomings of past attempts simply to extend 2D micropatterning approaches to form three-dimensional structures with high yield and reliability. Additionally, the challenge extends to the ability to pattern a wide range of. materials including polymers, semiconductors, ceramics, metals, biomaterials, and composites. To address these challenges, the symposium topics will cover a range of multidisciplinary topics from assembly and optical tweezers-based patterning to lithography and direct-write approaches. A strong panel of speakers has been assembled to describe both top-down and bottom-up methodologies, including DNA, protein, and viron-directed assembly and self assembly.BROADER IMPACTS: The symposium brings together experts in top-down and bottom-up patterning techniques to promote an exchange of ideas for combining these methods for specific applications. The organizers have given appropriate attention to the NSF objectives of broadening participation. Support provided by NSF will be used principally to support participation by graduate students and early career faculty, with particular attention to females and members of underrepresented groups. Plans for announcing the availability of travel and subsistence support for these populations are described as are appropriate procedures for selecting from the applicants for this support.

ID：MPS/DMR/BMAT（7623）0917832 PI：Mammarella，Paula ORG：材料研究学会名称：MRS研讨会BB材料系统和工艺的3D微和纳米制造和LithographyINTELLECTUAL优点：这个材料研究学会研讨会将提供一个论坛，介绍和讨论材料系统和工艺的最新发现3D微制造及其应用程序准备功能3D微和纳米器件。 对3D制造和组装方法的日益增长的兴趣源于过去简单地扩展2D微图案化方法以形成具有高产率和可靠性的三维结构的尝试的缺点。 此外，挑战还延伸到了对各种各样的图案进行图案化的能力。材料包括聚合物、半导体、陶瓷、金属、生物材料和复合材料。 为了应对这些挑战，研讨会的主题将涵盖一系列多学科的主题，从组装和基于光镊的图案化到光刻和直写方法。 一个强大的演讲者小组已经组装，以描述自上而下和自下而上的方法，包括DNA，蛋白质，和DNA导向的组装和自组装。更广泛的影响：研讨会汇集了自上而下和自下而上的模式化技术的专家，以促进交流的想法，结合这些方法的具体应用。 组织者对NSF扩大参与的目标给予了适当的关注。 NSF提供的支持将主要用于支持研究生和早期职业教师的参与，特别关注女性和代表性不足的群体。 宣布向这些人口提供旅行和生活支助的计划被描述为从申请人中选择这种支助的适当程序。