Preparation and Properties of Thin Film by Plasma-Assisted CVD for CO_2 Laser Lens

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1. Preparation of KC1 and NaC1 crystals. The growth of KC1 crystals, 80phix70mm, was carried on from the liquid by Automatic pull-up device TK-P1. The growth temperature was controlled as follows :Also, Nac1 crystal was formed on the same method.2. Fabrication of lens. The crystals were polished with the abrasives (Water, Liquid paraffin, Ethyl alcohol, Carborundum #500, 800, 1200, and Alumina 0.05 mu) and the dishes to form the lens of 5o and 60 mm focal distances, 60 and 70 mm in diameter, and 28 and 32mm in thickness.3. Thin film coating. Thin films on the surface of crystals were prepared better by PVD than plasma-assisted CVD to preserve the crystal lens from deliquescence and breakdown. The transmittance of film-coated lens was measured at 10.6mum in wavelength as follows :4.0.80-1.0mm of a hole was bored at high speed in the planks such as melapi wood and polyvinyl chlor using 17.5W cw CO_2 laser device (Assit gas N_2 : 2Kg/cm^2, XY-table speed : 300mm/s) with KC1//LiF lens. It is found that the present KC1//LiF can be employed instead of zinc selenide CO_2 lasers lens.