Characteristics of Strong Coupled Plasma
Characteristics of Strong Coupled Plasma
批准号:
05680390
负责人:
SHOJI Tatsuo
金额:
$1.34万
依托单位:
依托单位国家:
日本
项目类别:
Grant-in-Aid for General Scientific Research (C)
财政年份:
1993
资助国家:
日本
项目状态:
已结题
起止时间:
1993 至 1994
中文摘要
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英文摘要
Strongly coupled Coulombic system of a classical one-component plasma has been studied by using a two-dimensional (2-D) charged metallic particle system confined on a silicon (Si) wafer. The charge and the thermal motion of the particles are controlled by a high voltage on the wafer and an intensity of mechanical oscillation of the wafer produced by the sound from the speaker, separately.It has been demonstrated that the Coulomb coupling parameter for the particles GAMMA can be varied up to 2000. When GAMMA-240 (rotational energy is included in the estimation of GAMMA), the transition from the liauid to the Wigner triangle crystal phases is observed. The electrostatic plasma mode has been studied by measuring the spacial profile. and the frequency spectrum in the liquid phase (GAMMA-60) and compaired with the particle simulation results.
期刊论文(6)
专著(0)
科研奖励(0)
会议论文
T.Shoji, M.Fujigaya, I.Ohta, K.Tsuji Y.Kaneko and Y.Sakawa: "Strongly Coupled Plasma Experiment by Using A Z-D Charged Particle System" Proc.of the 12th Symposium on Plasma Processing. I. 461-466 (1995)
T.Shoji、M.Fujigaya、I.Ohta、K.Tsuji Y.Kaneko 和 Y.Sakawa:“使用 Z-D 带电粒子系统的强耦合等离子体实验”第 12 届等离子体处理研讨会论文集。
DOI:
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发表时间:
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影响因子:
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作者:
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通讯作者:
T.Shoji: "Strongly Coupled Plasma Experiment by Using A Z-D Charged Particle System" Proc.of the 12th Symposium on Plasma Processing. I. 461-466 (1995)
T.Shoji:“使用 Z-D 带电粒子系统的强耦合等离子体实验”第 12 届等离子体处理研讨会论文集。
DOI:
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发表时间:
期刊:
影响因子:
--
作者:
[]
通讯作者:
T.Shoji: "Strongly Coupled Plasma Experiment by Using A 2-D Charged Particle System" Proc.of the 12th Symposium on Plasma Processing. I. 461-466 (1995)
T.Shoji:“使用二维带电粒子系统的强耦合等离子体实验”第 12 届等离子体处理研讨会论文集。
DOI:
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发表时间:
期刊:
影响因子:
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作者:
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通讯作者:
Production and applications of high pressure large volume plasmas
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批准号:19540520
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项目类别:Grant-in-Aid for Scientific Research (C)
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资助金额:$2.91万
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财政年份:2007
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负责人:SHOJI Tatsuo
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依托单位:
Study on magnetized strongly coupled plasmas by using charged fine particles in a liquid
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批准号:11680482
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项目类别:Grant-in-Aid for Scientific Research (C)
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资助金额:$1.98万
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财政年份:1999
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负责人:SHOJI Tatsuo
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依托单位:
Characteristics of laser cooled one component plasma
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批准号:07458091
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项目类别:Grant-in-Aid for Scientific Research (B)
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资助金额:$4.99万
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财政年份:1995
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负责人:SHOJI Tatsuo
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依托单位:
New Limiter Concept Using RF Electric Field
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批准号:02680006
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项目类别:Grant-in-Aid for General Scientific Research (C)
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资助金额:$1.22万
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财政年份:1990
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负责人:SHOJI Tatsuo
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依托单位: