Surface Reaction Dynamics Studied by Hot-atom Beams

热原子束研究的表面反应动力学

• 批准号: 06453030
• 负责人: MATSUMOTO Yoshiyasu
• 金额: $ 0.64万
• 依托单位: Okazaki National Research Institute
• 依托单位国家: 日本
• 项目类别: Grant-in-Aid for General Scientific Research (B)
• 财政年份: 1994
• 资助国家: 日本
• 起止时间: 1994 至 1995
• 项目状态: 已结题
• 来源: https://kaken.nii.ac.jp/en/grant/KAKENHI-PROJECT-06453030/
• 关键词: Hot atom; Surdace Reaction; Platinum; Exchange reaction; Recombination; Photodissociation; 表面光化学

1. Excitation mechanism for photochemistry of methane on Pt (111).Methane adsorbed on Pt (111) surface is dissociated with 193 nm photons. The excitation mechanism was investigated by cross section measurements with a fixed polarization of laser as a function of incident angles. We found that direct excitation plays an important role.2. Photo-induced recombination reaction between hot H atoms and methyl adsorbates.Energetic hydrogen atoms produced via photodissociation of methane on Pt (111) further react with pre-adsorbed methyl to form methane before they dissipate energy to the bulk.3. Dynamics of the thermally induced recombination reaction between H and CH_3.Recombination reaction between hydrogen and methyl adsorbates on Pt (111) was investigated by pulse heating and TOF measurements. Methane produced by this reaction desorbs with the average kinetic energy of 0.43 eV.The angular distribution of methane is quite sharp along the surface normal. The obtained results were compared with the predictions of a model based on RRKM theory.

1.甲烷在Pt（111）表面光化学的激发机制：吸附在Pt（111）表面的甲烷被193 nm的光子解离。激发机制进行了研究，通过横截面测量与一个固定的偏振的激光作为入射角的函数。我们发现直接激发起着重要的作用。热氢原子与吸附的甲基分子发生光诱导复合反应，甲烷在Pt（111）表面光解产生的高能氢原子与吸附的甲基分子进一步反应生成甲烷，然后将能量耗散到体相中.本文用脉冲加热和飞行时间测量方法研究了Pt（111）表面上吸附的H_2和CH_3的热致复合反应动力学。由该反应产生的甲烷以0.43 eV的平均动能解吸。甲烷的角分布沿着表面法线是相当尖锐的。将所得结果与基于RRKM理论的模型的预测进行了比较。

项目成果

Y. A. Gruzdkov: "Photochemical C-H bond activation of methanecna Pt(111)surface" Chem. Phys. Lett.227. 243-247 (1994)

Y. A. Gruzdkov：“甲烷 Pt(111) 表面的光化学 C-H 键活化” Chem。

J.Lee, H.Kato, K.Sawabe, and Y.Matsumoto: "Angular distributions of N_2 in photodissociation of N_2O adsorbed on a partially oxidized Si (100) surface at 95K" Chemical Physics Letters. 240. 417-422 (1995)

J.Lee、H.Kato、K.Sawabe 和 Y.Matsumoto：“95K 时吸附在部分氧化的 Si (100) 表面上的 N_2O 光解中 N_2 的角分布”《化学物理快报》。

H. Kato: "Adsorbed states and thermal reactions of N_2O on Si(100) beleiroom temperature:Desorption induced by dissociation" Surface Science. (印刷中). (1996)

H. Kato：“Si(100) 室温下 N_2O 的吸附状态和热反应：解离引起的解吸”（出版中）。

H.kato: "Adsorbed states and thermal reactions of N_2O on Si (100) belew room temperature : Desorption induced by dissociation" Surface Science. (印刷中). (1996)

H.kato：“室温以下 N_2O 在 Si (100) 上的吸附状态和热反应：解离引起的解吸”（出版中）。

J. Lee: "Angular distributions of N_2 in photodissociation of N_2O adsorbed on a partially oxidized Si(100) surface at 95K" Chem. Phys. Lett.240. 417-422 (1995)

J. Lee：“95K 时吸附在部分氧化的 Si(100) 表面上的 N_2O 光解中 N_2 的角分布” Chem.