Surface electronic structure analysis of high current electron source materials and extreme operation analysis of FEAs

大电流电子源材料表面电子结构分析及有限元分析极限运行分析

• 批准号: 12135201
• 负责人: ADACHI H.
• 金额: $ 15.1万
• 依托单位: Muroran Institute of Technology
• 依托单位国家: 日本
• 项目类别: Grant-in-Aid for Scientific Research on Priority Areas
• 财政年份: 2000
• 资助国家: 日本
• 起止时间: 2000 至 2003
• 项目状态: 已结题
• 来源: https://kaken.nii.ac.jp/en/grant/KAKENHI-PROJECT-12135201/
• 关键词: FEA; Field electron emission; Field emission microscope; Micro emitter; Cathode; Electron beam; Current stability; Work function; エネルギー分析; 電子源; 雑音; 電子源アレイ; 放射特性; 低圧ガス雰囲気依存性; 安定性; 均一性; 極限動作

Electron emission from a field emitter array (FEA), especially Spindt type FEA was magnified by making use of an emission microscope, and uniformity and stability of the emission current were examined. Percentage of the active microtips was usually 40-50%, maximum value was 90%.The stability of the emission current was less than 10%, and the emission current fluctuation should be caused by the ion bombarding. The emission current and its uniformity was improved with the introduction of low pressure gas. Hydrogen and nitrogen gas showed the cleaning effect. Methane and ethylene gas showed the increasing of the emission current. The n-type Si FEA was also observed by emission microscope. The Si FEA showed large fluctuation than the Spindt type FEA. W (100) needle was covered with Yttrium oxide to improve the emission current density. Such YO/W (100) emitter showed low work function value (2.1eV). Mo (100) needle covered with Zirconium oxide also showed low work function (2.0eV).

利用发射显微镜对场发射体阵列（FEA），特别是Spindt型FEA的电子发射进行了放大，并对发射电流的均匀性和稳定性进行了考察。发射电流的稳定性小于10%，发射电流的波动可能是离子轰击引起的。通过引入低压气体，提高了发射电流及其均匀性。氢气和氮气显示出清洗效果。甲烷和乙烯气体的排放电流增加。用发射显微镜观察了n型Si FEA。Si FEA显示出比Spindt型FEA更大的波动。在W（100）针上覆盖氧化钇以提高发射电流密度。这种YO/W（100）发光体显示出低的功函数值（2.1eV）。用氧化锆覆盖的Mo（100）针也显示出低功函数（2.0eV）。

项目成果

Y.Saitho, H.Nakane, H.Adachi: "Field electron emission from W covered with In"Journal of Vacuum Science and Technology. vol.B18(2). 1093-1096 (2000)

Y.Saitho、H.Nakane、H.Adachi：“In 覆盖的 W 场电子发射”真空科学与技术杂志。

安達 洋, 中根 英章: "電界放射顕微鏡を用いた電界放射陰極列の電子放射特性の測定"表面科学. 23. 18-23 (2002)

Hiroshi Adachi、Hideaki Nakane：“使用场发射显微镜测量场发射阴极阵列的电子发射特性”《表面科学》23. 18-23 (2002)。

S.Kawata, H.Nakane, H.Adachi: "Study on the atomic configuration for low-energy electron diffraction analysis on ZrO/W(100)"Journal of Vacuum Science and Technology. B19. 55-56 (2001)

S.Kawata、H.Nakane、H.Adachi：“ZrO/W(100)低能电子衍射分析的原子构型研究”真空科学与技术杂志。

H.Nakane, et al: ""Emission stability of FEA observed by an emission microscope.""Technical Report of IEICE Japan.. ED2000-205. 1-6 (2000)

H.Nakane 等人：“通过发射显微镜观察到的 FEA 的发射稳定性。”“IEICE 日本的技术报告.. ED2000-205。

T.Kawakubo, Y.Saito, N.Miyamoto, H.Nakane, H.Adachi: "Remarkably low value of work function on W(100) produced by Y-O composite layer."16^<th> International Vacuum Micro-electronics Conference. P1-15. 117-118 (2003)

T.Kawakubo、Y.Saito、N.Miyamoto、H.Nakane、H.Adachi：“Y-O 复合层产生的 W(100) 功函数值非常低。”第 16 届国际真空微电子会议