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FUNCTIONAL COATING BY MEANS OF RADIATE RF MAGNETRON SPUTTERING

通过辐射射频磁控溅射进行功能涂层

基本信息

批准号：
05555043
负责人：
MORI Tshihiko
金额：
$ 4.8万
依托单位：
NAGOYA UNIVERSITY
依托单位国家：
日本
项目类别：
Grant-in-Aid for Developmental Scientific Research (B)
财政年份：
1993
资助国家：
日本
起止时间：
1993 至 1994
项目状态：
已结题

来源：
https://kaken.nii.ac.jp/grant/KAKENHI-PROJECT-05555043/
关键词：
RADIATED SPUTTERING RADIO FREQUENCY SPUTTERING MAGNETRON SPUTTERING FUNCTIONAL COATING FUNCTIONALLY GRADIENT FILM TITANIUM NITRIDE FILM TUNGSTEN CARBIDE FILM 傾斜機能 TiN層

项目摘要

Coatings of cutting tips are demanded not only for their good surface properies but also for good adherence to the substrate. The former are related to high stability, high strength and etc. and the latter to bonding characteristics between film layr and substrate and etc. The WC-TiN gradient coating was conducted by rf magnetron sputtering using multi S-guns. In order to explain the gradient coating mechanism, various analyzes were carried out ; an X-ray Diffraction for an inspection of crystalline structures, an Auger Electron Spectral Analysis for an inspection of chemical compositions and a Scanning Electron Microscopy for observations for sectioned film layrs. Two mechanisms play an important role in improving the bonding characteristics. One is that sputter-deposited elements of each layr are composed of the same crystalline structure as NaCl type. Another one is a part of carbon from WC diffuses into the substrate. The deposition of a beta-WC_<1-X>, when in a stable state at high temperature, is due to a rapid cooling and removal of partial carbon.

切削尖端的涂层不仅要有良好的表面性能，而且要与基体有良好的附着力。前者与高稳定性、高强度等有关，后者与膜层与基材之间的结合特性等有关。采用射频磁控溅射技术制备WC-TiN梯度涂层。为了解释梯度涂覆机理，进行了各种分析；用于检查晶体结构的x射线衍射，用于检查化学成分的俄歇电子能谱分析和用于观察切片薄膜层的扫描电子显微镜。两种机制在改善粘接特性方面起着重要作用。一是每层溅射沉积元素的晶体结构都与NaCl型相同。另一种是WC中的一部分碳扩散到基体中。在高温稳定状态下，β - wc_ <1-X>的沉积是由于快速冷却和部分碳的去除。