Fabrication of photonic crystals by three dimensional interference with four waves

四波三维干涉制备光子晶体

基本信息

批准号：
11650042
负责人：
SHIMURA Tsutomu
金额：
$ 2.3万
依托单位：
University of Tokyo
依托单位国家：
日本
项目类别：
Grant-in-Aid for Scientific Research (C)
财政年份：
1999
资助国家：
日本
起止时间：
1999 至 2000
项目状态：
已结题

项目摘要

We investigated the fabrication of the photonic crystals by three dimensional interference pattern with four lightwaves in materials whose refractive index is changed according to the light intensity. At first proposal, we tried the method using photo-sensitive polymers. Unfortunately, an British research group has reported the same results, thus, we changed the research direction slightly. We chose photorefractive materials instead of photo-sensitive polymers as a recording materials of the three dimensional interference pattern. Because the change of the refractive index is up to the order of 10^<-2>, photonic band gap cannot be realized. However, this kind of three dimensional modulation of the refractive index causes several remarkable effects, such as anomalous group velocity, and a promising candidate for the future photonic devices.When we consider the three dimensional four-wave interference, we have to take into account of the relation of the polarization of hour waves as well as the direction of k vectors. We investigated the effect of the polarization on the three dimensional interference theoretically. Also we compared the simultaneous exposure with all four waves and the sequential exposure with each set of two waves.We also studied the non-volatile recording of the three dimensional index patterns in photorefractive crystals. We tried two methods. One is a method using three levels of one element, and the other is that using two different elements as impurities. We studied two photon recording in photorefractive materials with these two methods both theoretically and experimentally. We obtained fundamental knowledge about the non-volatile recording.

我们通过三维干扰模式研究了光子晶体的制造，并在材料中使用四个灯光波动，其折射率根据光强度改变。首先，我们使用光敏聚合物尝试了该方法。不幸的是，一个英国研究小组报告了相同的结果，因此，我们稍微改变了研究方向。我们选择了光赋予材料而不是光敏聚合物作为三维干扰模式的记录材料。由于折射率的变化达到了10^<-2>的顺序，因此无法实现光子带隙。然而，这种折射率的三维调节会引起几种显着的影响，例如异常组速度，以及对未来光子设备的有前途的候选者。当我们考虑三维四维干扰时，我们必须考虑到小时浪潮以及k vectors therionderionder的极化关系的关系。我们从理论上研究了极化对三维干扰的影响。另外，我们还将所有四个波和顺序暴露的同时暴露与每组两波的曝光进行了比较。我们还研究了光赋予晶体中三维指数模式的非易失性记录。我们尝试了两种方法。一种是一种使用三个元素的方法，另一个是使用两个不同的元素作为杂质。我们在理论上和实验上研究了这两种方法，研究了两种光子记录。我们获得了有关非易失性记录的基本知识。