The analysis of bisphenol A and that derivatives leaced from Bis-GMA based resin.

双酚 A 及其衍生物的分析从 Bis-GMA 基树脂中提取。

基本信息

  • 批准号:
    12672025
  • 负责人:
  • 金额:
    $ 1.73万
  • 依托单位:
  • 依托单位国家:
    日本
  • 项目类别:
    Grant-in-Aid for Scientific Research (C)
  • 财政年份:
    2000
  • 资助国家:
    日本
  • 起止时间:
    2000 至 2001
  • 项目状态:
    已结题

项目摘要

To obtain the basic information elucidating the hydrolysis and decocmposition of leached mcncmers, and evaluate the polymerization degree under different exposure condition the residual unpolymeryzed monomers leached into the distilled water and organic solvent eluates from resin selants that was cured using the Xenon lamp as the light source which make polymerization possible during short exposure time were quantified From the study we got the following cctidusicra.1. The leach of monomer from resin selants into the distilled water eluate was identified as TEGDMA. Ihe total leach of TEGDMA during twenty-eight days was affected extensively by the irradiation time and type of light-curing unit for the any kind of resin selant.2. Whatever conditions it was demonstrated that in the distilled water the daily leached of TEGDMA on the first day was the greatest and it sharply declined from the fourth day to the seventh day. After that it became approximately stable.3. The leache of unplymerized monomer in the organic solvent eluate was identified as TEGDMA and BisGMA. The amount of leach of monomer was greater than that of the latter. The elution of TEGDMA was not affected by the irradiation time for Control, but it decreased with the exposure time more than ten seconds for Credi and PAC. The leach of TEGDMA from TF and the leach of BisGMA showed deereasing with the prolongation of irradiation time under the any light-curing unit.4. It was showed that the amount of residual monomers leached in organic solvent was greater than in distilled water.5. It was suggested that the enough exposure time, more than 10 seconds, is necessary to minimum the amount of unpolymerized monomer in set selants using the high performance curing unit with Xenon lamp tube as light source.
为了获得阐明浸出单体水解和分解的基本信息,并评估不同暴露条件下的聚合度,对使用氙灯作为光源固化的树脂密封剂中浸出到蒸馏水和有机溶剂中的残留未聚合单体进行了量化,这些单体可以在短曝光时间内进行聚合。 cctidusicra.1。从树脂密封剂浸出到蒸馏水洗出液中的单体被鉴定为 TEGDMA。对于任何一种树脂密封胶,28天内TEGDMA的总浸出量均受照射时间和光固化装置类型的影响很大。2.无论在何种条件下,蒸馏水中TEGDMA的日浸出量在第一天最大,从第四天到第七天急剧下降。此后它变得大致稳定。3。有机溶剂洗出液中浸出的未聚合单体被鉴定为TEGDMA和BisGMA。单体浸出量大于后者。对于对照,TEGDMA 的洗脱不受照射时间的影响,但对于 Credi 和 PAC,TEGDMA 的洗脱随着照射时间超过 10 秒而下降。在任意光固化装置下,随着照射时间的延长,TF中TEGDMA的浸出率和BisGMA的浸出率均出现脱毛现象。 4.结果表明,在有机溶剂中浸出的残留单体量大于在蒸馏水中浸出的残留单体量。 5.建议使用以氙灯管为光源的高性能固化装置,需要足够的曝光时间(超过10秒)以最小化固化密封剂中未聚合单体的量。

项目成果

期刊论文数量(7)
专著数量(0)
科研奖励数量(0)
会议论文数量(0)
专利数量(0)
川口 稔: "ティッシュコンディショナーからの可塑剤成分の溶出性"補綴誌. 45. 504-511 (2001)
Minoru Kawaguchi:“组织调节剂中增塑剂成分的洗脱”修复学杂志 45. 504-511 (2001)。
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    0
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川口 稔: "テンポラリークラウン用レジンからの未反応モノマーの溶出挙動"補綴誌. 44. 776-780 (2000)
Minoru Kawaguchi:“临时牙冠树脂中未反应单体的洗脱行为”Prosthodontics Journal 44. 776-780 (2000)。
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    0
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Minoru Kawaguchi, et al.: "Leaching of Unreacted Monomer from Tenporary Crown Resins"J Jpn prosthodont Soc.. 44. 776-780 (2000)
Minoru Kawaguchi 等:“Leaching of Unreacted Monomer from Tenporary Crown Resins”J Jpn prothodont Soc.. 44. 776-780 (2000)
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    0
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Kawaguchi Minoru, et al.: "Leaching of Plasticizers from Tissue Conditioners"J Jpn prosthodont Soc.. 45. 504-511 (2001)
Kawaguchi Minoru 等人:“组织调节剂中增塑剂的浸出”J Jpn prothodont Soc.. 45. 504-511 (2001)
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    0
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川口稔: "テンポラリークラウン用レジンからの未反応モノマーの溶出挙動"補綴誌. 44. 776-780 (2000)
Minoru Kawaguchi:“临时牙冠树脂中未反应单体的洗脱行为”Prosthodontics Journal 44. 776-780 (2000)。
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KUBOYAMA Hiroko其他文献

KUBOYAMA Hiroko的其他文献

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  • 批准号:
    60771839
  • 财政年份:
    1985
  • 资助金额:
    $ 1.73万
  • 项目类别:
    Grant-in-Aid for Encouragement of Young Scientists (A)
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