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The analysis of bisphenol A and that derivatives leaced from Bis-GMA based resin.

The analysis of bisphenol A and that derivatives leaced from Bis-GMA based resin.
双酚 A 及其衍生物的分析从 Bis-GMA 基树脂中提取。
批准号:
12672025
负责人:
KUBOYAMA Hiroko
金额:
$1.73万
依托单位:
依托单位国家:
日本
项目类别:
Grant-in-Aid for Scientific Research (C)
财政年份:
2000
资助国家:
日本
项目状态:
已结题
起止时间:
2000 至 2001

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中文摘要
翻译
为了获得浸出单体的水解和煎煮的基本信息,并评价不同曝光条件下的聚合度,本研究对以氙灯为光源固化的树脂中残留的未聚合单体和有机溶剂洗脱液进行了量化,使短时间内聚合成为可能。单体从树脂中浸出到蒸馏水洗脱液中,经鉴定为TEGDMA。TEGDMA在28天内的总浸出量受照射时间和任何树脂本身的光固化单元类型的广泛影响。无论在何种条件下,在蒸馏水中,TEGDMA的日浸出量在第一天最大,从第四天到第七天急剧下降。在那之后,它变得基本稳定。未聚合单体在有机溶剂洗脱液中的萃取物经鉴定为TEGDMA和BisGMA。单体的浸出量大于后者。TEGDMA的洗脱不受照射时间的影响,但Credi和PAC的照射时间超过10s后,TEGDMA的洗脱能力降低。在任何光固化单元下,TEGDMA的浸出量和BisGMA的浸出量均随光照时间的延长而减小。结果表明,有机溶剂中残留单体的浸出量大于蒸馏水中的残留单体。建议在以氙灯为光源的高性能固化装置中,要使SET-SELANT中的未聚合单体含量最少,曝光时间应在10s以上。
英文摘要
To obtain the basic information elucidating the hydrolysis and decocmposition of leached mcncmers, and evaluate the polymerization degree under different exposure condition the residual unpolymeryzed monomers leached into the distilled water and organic solvent eluates from resin selants that was cured using the Xenon lamp as the light source which make polymerization possible during short exposure time were quantified From the study we got the following cctidusicra.1. The leach of monomer from resin selants into the distilled water eluate was identified as TEGDMA. Ihe total leach of TEGDMA during twenty-eight days was affected extensively by the irradiation time and type of light-curing unit for the any kind of resin selant.2. Whatever conditions it was demonstrated that in the distilled water the daily leached of TEGDMA on the first day was the greatest and it sharply declined from the fourth day to the seventh day. After that it became approximately stable.3. The leache of unplymerized monomer in the organic solvent eluate was identified as TEGDMA and BisGMA. The amount of leach of monomer was greater than that of the latter. The elution of TEGDMA was not affected by the irradiation time for Control, but it decreased with the exposure time more than ten seconds for Credi and PAC. The leach of TEGDMA from TF and the leach of BisGMA showed deereasing with the prolongation of irradiation time under the any light-curing unit.4. It was showed that the amount of residual monomers leached in organic solvent was greater than in distilled water.5. It was suggested that the enough exposure time, more than 10 seconds, is necessary to minimum the amount of unpolymerized monomer in set selants using the high performance curing unit with Xenon lamp tube as light source.
期刊论文(7)
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会议论文
川口 稔: "ティッシュコンディショナーからの可塑剤成分の溶出性"補綴誌. 45. 504-511 (2001)
Minoru Kawaguchi:“组织调节剂中增塑剂成分的洗脱”修复学杂志 45. 504-511 (2001)。
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川口 稔: "テンポラリークラウン用レジンからの未反応モノマーの溶出挙動"補綴誌. 44. 776-780 (2000)
Minoru Kawaguchi:“临时牙冠树脂中未反应单体的洗脱行为”Prosthodontics Journal 44. 776-780 (2000)。
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Minoru Kawaguchi, et al.: "Leaching of Unreacted Monomer from Tenporary Crown Resins"J Jpn prosthodont Soc.. 44. 776-780 (2000)
Minoru Kawaguchi 等:“Leaching of Unreacted Monomer from Tenporary Crown Resins”J Jpn prothodont Soc.. 44. 776-780 (2000)
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Kawaguchi Minoru, et al.: "Leaching of Plasticizers from Tissue Conditioners"J Jpn prosthodont Soc.. 45. 504-511 (2001)
Kawaguchi Minoru 等人:“组织调节剂中增塑剂的浸出”J Jpn prothodont Soc.. 45. 504-511 (2001)
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