Accumulation Process of Negative Ions in a Hollow-Type Magnetized Plasma
Accumulation Process of Negative Ions in a Hollow-Type Magnetized Plasma
批准号:
12680477
负责人:
MIENO Tetsu
金额:
$1.98万
依托单位:
依托单位国家:
日本
项目类别:
Grant-in-Aid for Scientific Research (C)
财政年份:
2000
资助国家:
日本
项目状态:
已结题
起止时间:
2000 至 2001
中文摘要
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英文摘要
1) A magnetized plasma from CF_4 gas is generated by the electron cyclotron resonance discharge and a follow-type magnetized plasma is produced by use of a disk-type obstacle at the downstream region of the plasma. Inside the hollow-type plasma, fluorine positive and negative ions are accumulated, generating an ion-ion plasma. By means of a probe measurement, the ratio of negative ion density to electron density becomes more than 20. This phenomenon can be explained by a difference of radial diffusion speeds of electrons and negative ions. As the radial direction diffusion speed is decided by the collision frequency with neutral particles and a step length (a Lamor radius), the negative ions have much larger diffusion speed than that of electrons. As a result, positive and negative ions are preferably diffused into the vacuum region inside the hollow plasma. On the other hand, along the line of magnetic field, electron and ions freely move. At the end plates, high energy electrons tend … More s to flow into the plates beyond a barrier of sheath potential. Otherwise, the negative ions are reflected by the sheath barrier potential and well confined between the end plates. By this process, negative ions are effectively accumulated inside the hollow plasma2) By means of a multi-hole type obstacle, a multi-string plasma is produced at the down-flow region of the magnetized plasma from CF_4 gas. In this case, negative ions accumulate around the string plasmas. Here, many string plasmas are generated with same interval and large volume negative-ion accumulation can be produced. As a results, the large area negative ion source with cross-section of 30 cm^2 has been successfully generated. By use of a magnetic filter a negative ion-beam can be extracted from this plasma source and can be used for the large-area negative ion processing and the neutral beam processing.3) By means of a UV-range pulsed laser, amount of negative ions inside the follow plasma is measured and it is compared with the probe data. Less
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T.Mieno, T.Shoji, V.G.Zorin, S.Miyake: "Ion Cyclotron Resonannce Mass Spectro metry in a Strongly Magnetized ECR Plasma"Proc. 25^<th> Inf. Conf. Phenomena Ioniged Gases. 4. 283-284 (2001)
T.Mieno、T.Shoji、V.G.Zorin、S.Miyake:“强磁化 ECR 等离子体中的离子回旋共振质谱测量”Proc。
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通讯作者:
三重野 哲: "第12回プラズマエレクトロニクス講習会テキスト"(社)応用物理学会. 20 (2001)
Satoshi Mieno:“第12届等离子体电子学研讨会正文”日本应用物理学会20(2001)。
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三重野哲(分担): "電気学会技術報告第765号、第2章4.3「ラジカル計測」の部分"電気学会(放電技術委員会編). 4 (2000)
Satoshi Mieno(贡献者):“IEEJ 技术报告第 765 号,第 2 章 4.3“激进测量”部分”IEEJ(放电技术委员会编辑)4 (2000)。
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S.Tsuruta, T.Mieno: "Continuous Accumulation of Negative Ions by Means of a Magnetized Hollow-Plasma"Proc.1st Int.Sympo-Advanced Fluid Information (ZaOh). Vol.1. 202-205 (2001)
S.Tsuruta、T.Mieno:“通过磁化空心等离子体连续积累负离子”Proc.1st Int.Sympo-Advanced Fluid Information (ZaOh)。
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S-C.Yang, T.Mieno: "Production of Fluorinated Fullerene Film by a CF_4 RF Plasma"Thin Solid Films. Vol.386. 286-290 (2001)
S-C.Yang、T.Mieno:“通过 CF_4 RF 等离子体生产氟化富勒烯薄膜”固体薄膜。
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