Particle Flow and Dynamic Response of Potential Formation at the Plug Region of a Tandem Mirror

串联镜插头区域潜在形成的粒子流和动态响应

• 批准号: 13680551
• 负责人: SAITO Teruo
• 金额: $ 2.11万
• 依托单位: University of Tsukuba
• 依托单位国家: 日本
• 项目类别: Grant-in-Aid for Scientific Research (C)
• 财政年份: 2001
• 资助国家: 日本
• 起止时间: 2001 至 2002
• 项目状态: 已结题
• 来源: https://kaken.nii.ac.jp/grant/KAKENHI-PROJECT-13680551/
• 关键词: Plasma; Tandem Mirror; End Plate; Plug Potential; Potential Formation Mechanism; Monte Carlo Simulation; Sheath

The objective of this research is understanding of the mechanism of the plug potential formation through investigation of the change of particle flow at the plug region of a tandem mirror associated with electron heating. In this year, dynamic variation of the potential structure from the plug region to the end plate during electron cyclotron resonance heating (ECRH) has been studied. Main results are as follows.(1) It has been found that potential formation by the plug ECRH is a dynamic process in which the density distribution and the change of the potential is closely linked. Moreover, the plug potential gears with the end plate potential. This means that the end plate potential has a large influence on the plug potential as measured from the vacuum vessel.(2) We have presented a model of an equivalent circuit that includes the current distribution from the plug/barrier region to the end plate and potential structure. The role of the plug ECRH is generation of the electromotive force in this circuit. This electromotive force is divided into the plug potential and the negative end plate potential according to the values of the effective resistance from each region to the vacuum vessel.(3) The current in this circuit flows through the sheath region on front of the end plate. The analysis of the end plate potential from the viewpoint of a current carrying sheath has confirmed the validity of our potential model.(4) Theoretical studies have been carried out along with the above investigations. We have succeeded to develop a potential model that includes the temperature anisotropy as a result of ECRH and the modified Boltzmann relation. This model correctly predicts the dynamic behavior of the potential creation. The importance of the Coulomb collisions for continuity of the axial potential profile near the plug region has been pointed out.

本研究的目的是通过研究电子加热对串列镜塞区粒子流的影响，了解塞势形成的机理。本文研究了电子回旋共振加热（ECRH）过程中从塞区到端板的势结构的动态变化。主要结果如下。(1)结果表明，塞式ECRH的电势形成是一个动态过程，密度分布与电势变化密切相关。此外，插头电位与端板电位相匹配。这意味着端板电势对从真空容器测量的塞电势具有很大的影响。(2)我们已经提出了一个模型的等效电路，其中包括从塞/势垒区的端板和潜在的结构的电流分布。插头ECRH的作用是在该电路中产生电动势。根据从每个区域到真空容器的有效电阻的值，该电动势被分为塞电势和负端板电势。(3)该电路中的电流流过端板前面的护套区域。从载流鞘层的角度对端板电位进行了分析，证实了电位模型的正确性。(4)在上述研究的基础上，沿着开展了理论研究。我们已经成功地开发了一个潜在的模型，包括温度各向异性的ECRH和修改后的玻尔兹曼关系的结果。该模型正确地预测了势能产生的动态行为。指出了库仑碰撞对塞区附近轴向势分布连续性的重要性。

项目成果

I. Katanuma, et al.: "Collision effects on the saturated electrostatic potential along a magnetic field line"Physics of Plasmas. 10. 677-682 (2003)

I. Katanuma 等人：“沿磁场线对饱和静电势的碰撞效应”等离子体物理学。

T.Saito et al.: "Potential Linkage between the Plug Region and an End Plate in GAMMA 10"J.Plasma and Fusion Research. 78-6. 591-598 (2002)

T.Saito 等人：“GAMMA 10 中插头区域和端板之间的潜在联系”J.Plasma and Fusion Research。

T. Saito et al.: "Potential Linkage between the Plug Region and an End Plate in GAMMA 10"J. Plasma and Fusion Research. 78. 591-598 (2002)

T. Saito 等人：“GAMMA 10 中插头区域和端板之间的潜在联系”J。

I.Katanuma, et al.: "Collision effects on the saturated electrostatic potential along a magnetic field line"Physics of Plasmas. Vol.10(to be piblished). (2003)

I.Katanuma 等人：“沿磁场线对饱和静电势的碰撞效应”等离子体物理学。

T. Saito et al.: "Axial and Radial Potential Structure and Current Flow in GAMMA 10"J. Plasma and Fusion Research Series. Vol.4(to be published). (2002)

T. Saito 等人：“GAMMA 10 中的轴向和径向电势结构和电流”J。