Characterization of the high power laser diode and beta iron disilicde by microscopic Raman spectroscopy
Characterization of the high power laser diode and beta iron disilicde by microscopic Raman spectroscopy
批准号:
14550292
负责人:
KISHI Masato
金额:
$2.37万
依托单位:
依托单位国家:
日本
项目类别:
Grant-in-Aid for Scientific Research (C)
财政年份:
2002
资助国家:
日本
项目状态:
已结题
起止时间:
2002 至 2004
中文摘要
在这个项目中,我们已经调查了显微拉曼光谱的高功率激光二极管端面的表征的可用性,并已通过脉冲激光沉积方法沉积的二硅化铁的基本性质进行了表征。在工作状态下,对紫光激光二极管端面进行了显微拉曼光谱分析.有源半导体激光器发出的激光可以被滤光片阻挡,其能级低到足以获得拉曼信号。虽然适用于红色激光二极管,但由于二极管的强黄光发射,认为该方法不适用于GaN系统。即使在阈值电流下,这种强黄色发射也与相对弱的拉曼信号重叠。根据理论上的考虑,难以通过晶体的热传导去除在高功率操作条件下在发光器件的刻面处产生的热能。解决这一问题的直接方法是在器件封装中填充导热流体。采用室温脉冲激光沉积和350℃以下退火的方法,在低温下成功地形成了液滴状的β-FeSi_2多晶微结构。通过显微拉曼光谱和透射电子显微镜分析得到了β相形成的证据。低温性质可能源于中间非晶相的形成,该中间非晶相可能由从由激光烧蚀产生的Fe-Si熔体中的快速热移除提供。这种低温方案提供了一种无需高温工艺而制备多晶β-FeSi_2的替代方法,其可以有利地与标准Si器件制造工艺兼容。
英文摘要
In this project we have surveyed the availability of microscopic Raman spectroscopy for the characterization of the high power laser diode facet and have characterized the basic properties of iron disilicide deposited by pulsed laser deposition method.Most generally GaN and related alloys are used on blue or violet laser diodes. We applied the microscopic Raman spectroscopy to the violet laser diode facet in operating condition. Laser light from active laser diode can be blocked by the filter and its level is low enough to obtain Raman signal. Although applicable to the red laser diode, it is considered that this method is not applicable to GaN system because of the strong yellow emission from the diode. This strong yellow emission overlaps with relatively weak Raman signal, even under threshold current. According to the theoretical consideration, it is difficult to remove the thermal energy produced at the facets of the light emitting devices under high power operation condition by thermal conduction of the crystals. Direct solution of this problem is to fill the device package with the thermal conduction fluid. Helium is the most effective material and some liquids are available depending on the condition of devices.β-FeSi_2 polycrystalline microstructure was successfully formed at low temperature in the form of droplet with room temperature pursed laser deposition and post-annealing below 350℃ employed. Evidence of the β-phase formation was obtained through microscopic Raman spectroscopy and TEM analysis. The low temperature nature may originate from formation of intermediate amorphous phase possibly provided by quick heat removal from Fe-Si melts generated by laser ablation. This low temperature scheme offers an alternative method of producing polycrystalline β-FeSi_2 without higher temperature processes, which could be beneficially compatible with the standard Si device fabrication processes.
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Low temperature formation of beta-FeSi2 droplets based on pulsed laser deposition
基于脉冲激光沉积的 β-FeSi2 液滴低温形成
DOI:
--
发表时间:
2003
期刊:
The 8th IUMRS International Conference on Advanced Materials Abstracts 2 C7-12-O15
影响因子:
--
作者:
[M.Kishi, T.Igarashi, M.Tsuchiya, J.Katayose, M.Ouchi, H.Sugawara]
通讯作者:
H.Sugawara
Low temperature formation of β-FeSi_2 polycrystalline by pulsed laser deposition and thermal annealing
脉冲激光沉积和热退火低温形成β-FeSi_2多晶
DOI:
--
发表时间:
2004
期刊:
2004 1st International Conference on Groupe IV Photonics Proceedings 0-7803-8475-X
影响因子:
--
作者:
[H.Sugawara, S.Nakamura, M.Oouchi, Y.Kumura, T.Shishido, M.Kishi, M.Tsuchiya]
通讯作者:
M.Tsuchiya
Low temperature formation of β-FeSi_2 polycrystalline microstructure by pulsed laser deposition and thermal annealing
脉冲激光沉积和热退火低温形成β-FeSi_2多晶微结构
DOI:
--
发表时间:
2004
期刊:
IEICE Electronics Express Vol.1, No.9
影响因子:
--
作者:
[H.Sugawara, S.Nakamura, M.Oouchi, Y.Kumura, T.Shishido, T.Igarashi, M.Kishi, M.Tsuchiya]
通讯作者:
M.Tsuchiya
PLD法と窒素雰囲気アニール処理によるβ-FeSi_2ドロップレットの低温生成
PLD法低温生成β-FeSi_2液滴及氮气氛退火处理
DOI:
--
发表时间:
2003
期刊:
第50回応用物理学関係連合講演会 講演予稿集 No.3
影响因子:
--
作者:
[五十嵐考俊, 岸眞人, 土屋昌弘, 片寄淳, 大内雅之, 菅原宏治]
通讯作者:
菅原宏治
Influence of initial substrate condition on the shape of PLD-grown Fe-Si amorphous droplet.
初始基底条件对 PLD 生长的 Fe-Si 非晶液滴形状的影响。
DOI:
--
发表时间:
2005
期刊:
Extended Abstracts (The 52^<nd> Spring Meeting, 2005) The Japan Society of Applied Physics and Related Societies
影响因子:
--
作者:
[S.Nakamura, M.Ashitomi, T.Shishido, T.Sasaki, H.Sugawara, M.Kishi, M.Tsuchiya]
通讯作者:
M.Tsuchiya
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