Development of the Novel Nano Trench-Patterned Culture Surface for Initiating Differentiation of Mesenchymal Stem Cell

点击翻译按钮获取中文摘要

The novel cell patterning system was developed by utilizing the electron beam (EB) lithography and the EB-reactive polymer resists. And as a new method, we achieved inducing differentiation of mesechymal stem cell (MSC) just by culturing at the nano-topographic pattern of a single linear groove in 500 nm width, without transfecting any DNA and/or applying any biosignaling factor like concentional biological methods. MSCs were extraordinarily streched along the groove, presumably accompanying mechanical stress, and markedly increased gene expression of the neural markers and the osteogenic markers.