Fundamental studies of the mechanism of atmospheric pressure plasma deposition of thin films

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This project will extend fundamental understanding of the mechanisms occurring in a revolutionary plasma deposition process, atmospheric pressure plasma deposition, building upon a platform of technology developed over the last 12 months. The deposition process uses liquid containing the deposition source materials to confine the plasma. The enormous commercial potential of the process for wear-resistant coatings, biomaterials and electronics is currently limited by insufficient understanding of the basic mechanisms of deposition, and critical plasma parameters which control the process. This basic science project focusses on fundamental chemical and plasma processes, and will develop initial models, enabling generalisation of the process.