Development of the Metal Implant Having Nano-dimples on the Surface by the Plasma Discharge in Aqueous Solution to Enhance Epithelial Attachment

通过水溶液中等离子体放电开发表面具有纳米凹坑的金属植入物以增强上皮附着

• 批准号: 24792136
• 负责人: NAKAISHI Michiko
• 金额: $ 2.66万
• 依托单位: Niigata University
• 依托单位国家: 日本
• 项目类别: Grant-in-Aid for Young Scientists (B)
• 财政年份: 2012
• 资助国家: 日本
• 起止时间: 2012-04-01 至 2014-03-31
• 项目状态: 已结题
• 来源: https://kaken.nii.ac.jp/grant/KAKENHI-PROJECT-24792136/
• 关键词: 液中プラズマ放電; ナノ・ディンプル; 歯科インプラント; 口腔粘膜上皮細胞; 液中プラズマ

The peri-implantitis, which is induced by poor epithelial attachment to the implant surface, often causes the removal of implant. In this study, we first developed titanium having nano-dimples on the surface by means of the plasma discharge in aqueous solution, referred to as "in-liquid discharge Ti". Since in-liquid discharge Ti is a novel material and its properties have not fully investigated, we examined the ability of oral mucosa keratinocytes to attach the surface of in-liquid discharge Ti under two- and three-dimensional cell culture environment. As a result, we were able to coat the titanium surface with nanometer order dimples by means of the plasma discharge in aqueous solution. Our results also showed the cell proliferation and biocompatibility of the titanium surface. Furthermore, it was confirmed that epithelium did not detach from in-liquid discharge Ti even if the cell-attachment environment of titanium and epithelium was poor.

种植体周围炎，这是由不良的上皮附着到 种植体表面，经常导致种植体的移除。在这项研究中，我们首先开发了钛， 在水溶液中通过等离子体放电在表面上形成纳米凹坑，称为 “液中排放Ti”。由于钛是一种新型材料，其性能还没有得到很好的改善， 在充分研究的基础上，我们检测了口腔粘膜角质形成细胞附着在 在二维和三维细胞培养环境下的液中排出Ti。结果，我们 能够在水溶液中通过等离子体放电在钛表面涂覆纳米级凹坑。我们的研究结果还显示了细胞增殖和钛表面的生物相容性。 此外，确认了即使在液体中放电Ti的情况下，上皮也不从液体中放电Ti分离。 钛和上皮细胞的附着环境差。